[1]耿秋菊,周荣明,印仁和,等.冷轧钢板表面电解涂覆薄层二氧化硅过程的研究 Ⅱ.机理研究[J].电镀与精饰,2005,(3):5-7.
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冷轧钢板表面电解涂覆薄层二氧化硅过程的研究 Ⅱ.机理研究(
)
《电镀与精饰》[ISSN:1001-3849/CN:12-1096/TG]
- 卷:
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- 期数:
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2005年3
- 页码:
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5-7
- 栏目:
-
- 出版日期:
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2019-06-07
文章信息/Info
- Title:
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Study on the Process of Electrodeposition of Thin Silica Film on the Surface of Cold-rolled Steel Plate Ⅱ. Mechanism Discussion
- 作者:
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耿秋菊; 周荣明; 印仁和; 郁祖湛
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上海大学理学院化学系；上海大学理学院化学系；上海大学理学院化学系；复旦大学化学系
- 分类号:
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TG174.4
- 摘要:
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在已有各种工艺因素对电解涂硅量影响研究的基础上,对在高电流密度(100200A/dm2)及短时间(0.1s)电解条件下电解涂覆薄层(纳米量级)SiO2机理进行了初步研究,实验模拟了实际生产中采用的中间导体法,并运用多种测试方法对电解涂硅的机理进行了分析探讨,揭示了高电流密度下电解脱脂涂硅的吸附本质及SiO2在钢板表面的空间分布,并就钢板阴阳极两面涂硅量的不同原因进行了解释。
- Abstract:
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Based on the study of the various processing factors that influence the amounts of silicon on the steel surface, the mechanism of the electrodeposition of nano scale silica thin film at the condition of high current density (100～200 A/dm~2) and short time (0.1 s) was investigated. The bipolar electrolytic method used in practice production was simulated and some surface test methods was used to study the process of electrodepostion of silica on the steel. The adsorption qualities of the electrodeposition of silica and the space distribution of silica on the steel plate at the condition of high current density were revealed. In addition, the possible reason of the different amounts of silica on the two opposite electrode surfaces of the steel was discussed.
更新日期/Last Update:
2019-06-07