[1]杨竞涵,连 勇,张 津,等.doi: 10.3969/j.issn.1001-3849.2026.01.006镀铬层织构及残余应力随电沉积时间演变规律[J].电镀与精饰,2026,(01):47-52.
　YANG Jinghan,LIAN Yong,ZHANG Jin,et al.Evolution of chromium plating layer texture and residual stress with electrodeposition time[J].Plating & Finishing,2026,(01):47-52.
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doi: 10.3969/j.issn.1001-3849.2026.01.006镀铬层织构及残余应力随电沉积时间演变规律()

《电镀与精饰》[ISSN:1001-3849/CN:12-1096/TG]

卷:
期数:
2026年01
页码:
47-52
栏目:
出版日期:
2026-01-31

文章信息/Info

Title:
Evolution of chromium plating layer texture and residual stress with electrodeposition time
作者:
杨竞涵1; 2; 连 勇1; 2; 张 津1; 2; 丁啸云1; 2
(1. 北京科技大学 新材料技术研究院,北京100083; 2. 北京市腐蚀、磨蚀与表面技术重点实验室,北京100083)
Author(s):
YANG Jinghan1; 2;  LIAN Yong1; 2;  ZHANG Jin1; 2;  DING Xiaoyun1; 2
(1. Institute for Advanced Materials and Technology, University of Science and Technology Beijing, Beijing 100083, China; 2. Beijing Key Laboratory of Corrosion, Erosion and Surface Technology, Beijing 100083, China)
关键词:
电沉积铬; 电沉积时间; 织构; 残余应力
Keywords:
electrodeposited chromium;  electrodeposition time;  texture;  residual stresses
分类号:
TG174，TQ153
文献标志码:
A
摘要:
电沉积铬涂层广泛应用于军事、航空航天等领域，而铬涂层的强织构及残余应力与镀层的力学性能有密切的关系，直接影响到镀铬层的服役性能。通过调整电沉积时间对六价铬镀层的晶体取向和微观结构进行定量研究，并对镀层中残余应力的形成机理进行分析；采用XRD对涂层的宏观织构进行研究，并通过压痕法对残余应力进行测量。结果表明，初期镀层截面存在大量未贯穿的微裂纹，后期微裂纹宽度及数量显著下降。电沉积铬呈现出(222)晶面的择优取向，织构强度先缓慢降低后升高。电镀铬层的硬度不断增加，电沉积时间11?h时，镀层表面硬度相较于3?h时上升约为32%。镀层表面残余应力为拉应力，呈现先升高后降低的趋势，电沉积时间为9?h时，镀层表面残余应力最大，约为221?MPa。总之，在电沉积时间为11?h时，涂层在(222)有明显的择优取向，涂层中微裂纹较少，并具有更高的显微硬度(950 HV)及较低的残余应力(152?MPa)。
Abstract:
Electrodeposited chromium coatings are widely used in military, aerospace and other fields. However, the strong texture and residual stresses of chromium coatings are closely related to the mechanical properties, which directly affect the service performance. The crystal orientation and microstructure of hexavalent chromium coatings were quantitatively investigated by adjusting the electrodeposition time. The mechanism of residual stress formation in the coatings was analyzed. The macroscopic texture of the coating was investigated by XRD and the residual stress was measured by indentation method. The results shows that a large number of unpenetrated microcracks exists in the cross-section of the coating at the initial stage, and the width and number of microcracks decreases significantly at the later stage. The chromium coating shows a preferential orientation of the (222) crystal plane, and the texture strength decreases slowly and then increases. The microhardness of the chromium plated layer increases continuously, and the surface microhardness of the plated layer rises by about 32% at 1 1?h of electrodeposition time compared with that at 3?h. The microhardness of the plated layer increases by about 32% at 1 1?h compared with that at 3?h of electrodeposition time. The residual stress on the surface of the plated layer is tensile stress, which shows a tendency of increasing and then decreasing. When the electrodeposition time is 9?h, the residual stress on the surface of the plated layer is the largest, which is about 221?MPa. In conclusion, at the electrodeposition time of 11?h, the coatings have a higher preferential orientation at (222), and the coatings form fewer microcracks, and they have a higher microhardness (50 HV) and lower residual stress (15 2?MPa)

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更新日期/Last Update: 2026-01-16