[1]陈静华,王海荣,孙保库,等.doi: 10.3969/j.issn.1001-3849.2026.06.002真空电弧离子镀技术的研究现状及发展趋势[J].电镀与精饰,2026,(06):15-24.
 CHENG Jinghua,WANG Hairong,SUN Baoku,et al.Research progress and development trend of vacuum arc ion plating[J].Plating & Finishing,2026,(06):15-24.
点击复制

doi: 10.3969/j.issn.1001-3849.2026.06.002真空电弧离子镀技术的研究现状及发展趋势()

《电镀与精饰》[ISSN:1001-3849/CN:12-1096/TG]

卷:
期数:
2026年06
页码:
15-24
栏目:
出版日期:
2026-06-30

文章信息/Info

Title:
Research progress and development trend of vacuum arc ion plating
作者:
陈静华1王海荣1孙保库2叶贤槐1严 力3李 莉1
(1. 舟山市质量技术监督检测研究院,浙江 舟山 316000 ;2. 浙江省海洋开发研究院,浙江 舟山 316021 ;3. 舟山久实纳米涂层科技有限公司,浙江 舟山 316034)
Author(s):
CHENG Jinghua1 WANG Hairong1 SUN Baoku2 YE Xianhuai1 YAN Li3 LI Li1
(1. Zhoushan Institute of Calibration and Testing for Quality and Technology Supervision, Zhoushan 316000, China; 2. Zhejiang Marine Development Research Institute, Zhoushan 316021, China; 3. Zhoushan Jiushi Nano Coating Technology Co., Ltd., Zhoushan 316034, China)
关键词:
真空电弧离子镀大颗粒控制智能化复合沉积技术纳米镀层
Keywords:
vacuum arc ion plating large particle control intelligentization hybrid deposition techniques nano coatings
分类号:
TQ153;TG174.442
文献标志码:
A
摘要:
真空电弧离子镀是目前最先进、应用最广泛的表面工程技术,具有镀膜效率高,绕镀性好,镀层致密、附着力高,绿色环保等优点。本文概述了新型电弧源、弧斑运动控制技术和磁过滤装置等控制“大颗粒”缺陷的作用机制与效果;介绍了基于智能一体化控制系统、精确化在线监控技术的电弧离子镀设备向智能化、大型化发展的趋势;综述了电弧离子镀与磁控溅射等其他表面处理技术复合沉积、制备纳米结构等高性能复合镀层的最新研究进展。推动真空电弧离子镀技术根据需求向镀层性能更好、工艺更易、适应性更强方向发展,在更多行业中得到更广泛的应用。
Abstract:
Vacuum arc ion plating is currently the most advanced and widely applied surface engineering technology, featuring high coating efficiency, good over-coating performance, dense and highly adherent coatings, and environmental friendliness. In this manuscript, the mechanism and effect of “large particles” defects controlling technologies are summarized, such as new arc sources, arc spot motion control technology and novel magnetic filtering devices. Intelligent and large-scale trends of arc ion plating equipment based on intelligent control system and precise online monitoring technology are reviewed. The up-to-date research progresses on hybridizing with other surface treatment technology and high-performance composite coatings are presented. The vacuum arc ion plating technology will develop in the direction of better performance, easier process, stronger adaptability, and wider application based on the demands.

参考文献/References:

[1].ANURAG R, WANG S X, KYIAKOS K. A review of plasma-assisted deposition methods for amorphous carbon thin and ultrathin films with a focus on the cathodic vacuum arc technique[J]. Journal of Materials Research, 2023, 38(3): 586-616.
[2].王福贞, 武俊伟. 现代离子镀膜技术[M]. 北京: 机械工业出版社, 2021: 114.
[3].MIN B, KIM T, CHOI S. Estimate of the cathodic arc spot size in a nontransferred arc plasma torch by comparing theresults of a numerical analysis with the experimental results[J]. Journal of the Korean Physical Society, 2019, 74(8): 785-790.
[4].孙慧贤, 卢旭东, 迟百城, 等. 电弧离子镀铬涂层对钢1 000 ℃氧化行为的影响[J]. 电镀与精饰, 2025, 47(4): 96-100, 112.
[5].陈宝清, 陈大民, 董闯. 真空离子镀代替电镀功能膜研发历史及工艺研究[C]//中国表面工程协会转化膜专业委员会. 第十届全国转化膜及表面精饰学术年会论文集. 大连: 大连理工大学材料科学与工程学院, 大连远东真空技术有限公司, 2014: 93-101.
[6].HAE W Y, YURI C, KUK H Y, et al. Chromium coatings applied to Zr alloy claddings by cathodic arc ion plating: effect of nitrogen inclusion on limiting columnar defects[J]. Advanced Engineering Materials, 2024, 26(20): 2400804-2400811.
[7].ZHANG S, HUANG T, LIN L, et al. Spherical particle formation in arc ion plated TiSiN films from formation of droplets to core-shell structures[J]. Surface & Coatings Technology, 2025, 504(5): 132059-132069.
[8].BOXMAN R L, GOLDSMITH S. Macroparticle contamination in cathodic arc coatings: generation, transport and control[J]. Surface & Coatings Technology, 1992, 52(1): 39-50.
[9].郭朝乾, 林松盛, 石倩, 等. 基体负偏压及占空比对电弧离子镀CrN薄膜表面大颗粒和厚度的影响[J]. 电镀与涂饰, 2019, 38(13): 668-673.
[10].曹时义, 代伟, 王俊锋. 脉冲技术在离子镀膜中的应用机理和展望[J]. 真空科学与技术学报, 2022, 42(4): 244-255.
[11].RAMM J, GSTOEHL O, WIDRIG B, et al. Method for operating a pulsed arc source: US, 2005010 2337[P]. 2018-06-12.
[12].MA Y, GONG C, TIAN X, et al. Imaging and motion of cathode group spots during pulse enhanced vacuum arc evaporation [J]. Vacuum, 2017, 139: 37-43.
[13].聂军伟, 陈庆川, 祝土富, 等. 一种等离子体射流触发脉冲阴极弧源: CN, 202211667228. 7 [P]. 2024-06-25.
[14].FORLOVA V P, NIKOLAEV A G, OKS E M, et al. Pulsed vacuum arc plasma source of supersonic metal ion flow[J]. Review of Scientific Instruments, 2020, 91(20): 23302-23306.
[15].赵栋才, 马占吉, 刘兴光, 等. 多级触发脉冲电弧源技术制备掺氮Ta-C薄膜的力学性能研究[J]. 机械工程学报, 2023, 59(24): 108-117.
[16].赵栋才, 郑军, 张林, 等. 一种多级触发脉冲电弧源装置: CN, 202210602274.2[P]. 2024- 02-02.
[17].步天龙, 贾杰, 李迪, 等. 脉冲电弧离子镀工艺参数对氧化锌压电涂层结构与电阻的影响[J]. 材料保护, 2024, 57(5): 158-164.
[18].张泽, 张远涛, 张林, 等. 电弧离子镀涂层大颗粒缺陷控制与抑制技术研究进展[J]. 表面技术, 2025, 54(1): 1-16.
[19].XIAO B J, CHEN Y, DAI W, et al. Micro structure, mechanical properties and cutting performance of AlTiN coatings prepared via arc ion plating using the arc splitting technique[J]. Surface and Coatings Technology, 2017, 311: 98-103.
[20].ZHANG K, LANG W C, DU H, et al. Study on microspot splitting characteristics in cathode spot motion of vacuum arc[J]. Vacuum, 2023, 213: 112151-112163.
[21].LANG W C, ZHANG K, DU H, et al. Study on the microspot splitting characteristics of pulsed cathodic vacuum arc[J]. Vacuum, 2024, 221: 112920-112931.
[22].乔宏, 李灿伦, 蔺增, 等. 电弧离子镀弧斑运动对膜层质量影响分析[J]. 真空, 2022, 59 (5): 32-37.
[23].VASYLIEV V, STREL’NITSKIJ V E. Mechanisms affecting the speed and direction of vacuum arc cathode spots movement in a magnetic field[J]. Problems of Atomic Science and Technology, 2023, 143(1): 92-97.
[24].LIU L M, YUAN Z, CHEN L X, et al. Experimental investigation on the velocity of cathode spots in a vacuum arc with high di/dt[J]. Journal of Physics D: Applied Physics, 2022, 55(19): 1-10.
[25].MAHRLE A, ZIMMER O, SCHENK S, et al. A semi-empirical model of cathodic arc spot motion under the influence of external magnetic fields[J]. Plasma, 2023, 7(1): 1-15.
[26].SONG X, WANG Q, LIN Z, et al. Control of vacuum arc source cathode spots contraction motion by changing electromagnetic field[J]. Plasma Science and Technology, 2018, 20(2): 119- 125.
[27].ZHANG Z, MA H, LIU Z, et al. Cathode-constriction and column-constriction in high current vacuum arcs subjected to an axial magnetic field[J]. Journal of Physics D: Applied Physics, 2018, 51(14): 145203-145203.
[28].刘野, 刘晓华, 马槽伟. 一种离子源磁场分布结构: CN, 201510966434.1[P]. 2016-03-30.
[29].乔宏. 阴极电弧源磁场特性对大颗粒和靶材利用率的影响规律研究[D]. 沈阳: 东北大学, 2019.
[30].CHO Y K, CHOI Y. Arc evaporation source having central depression magnetic field and arc ion plating apparatus and vapor deposition method of metal/metal compound using the same: KR, 20210094902[P]. 2024-05-22.
[31].马迎慧, 张钧. 多弧离子镀中磁场控弧技术的研究进程与展望[J]. 材料保护, 2019, 52(2): 107-112.
[32].潘家敬, 路海涛. 一种磁场辅助阴极电弧离子镀蒸发源: CN, 202111433226.7[P]. 2023- 10-27.
[33].周敏, 王文宝, 朱岩, 等. 弧源磁场装置, 调节方法及电弧离子镀膜设备: CN, 20181121 0482.8[P]. 2019-01-18.
[34].WANG S, LIN Z, QIAO H, et al. Influence of a scanning radial magnetic field on macro particle reduction of arc ion-plated films[J]. Coatings, 2018, 8(2): 49-58.
[35].OKAZAKI N, YOSHIHARA K, ISHIZUKA H, et al. Arc evaporation source: US, 9953808B2[P]. 2018-04-24.
[36].郎文昌, 赵战锋, 杜昊, 等. 多模式交变耦合磁场辅助电弧离子镀弧源设计[J]. 真空科学与技术学报, 2015, 35(8): 913-918.
[37].蒋钊, 肖更竭, 周辉, 等. 一种磁路可控式真空阴极电弧离子源: CN, 201911353751.0[P]. 2022-01-21.
[38].JUN H S, EUN H B. High-efficiency arc source: KR, 20210116343[P]. 2023-03-08.
[39].王晓奇, 曹慧, 雷彪. 镁合金表面电弧离子镀TiAlN薄膜的结构与性能研究[J]. 电镀与精饰, 2021, 43(6): 25-29.
[40].杨木. 多弧离子镀磁过滤装置关键技术研究[D]. 合肥: 合肥工业大学, 2018.
[41].马震宇, 周潜, 李润涵, 等. 一种多弯管磁过滤真空阴极电弧离子镀装置: CN, 20231060 1588. 5[P]. 2023-09-29.
[42].黄杰, 史学伟, 廖斌, 等. 新型多弧磁过滤系统对TiAlN薄膜的组分调控[J]. 中国表面工程, 2019, 32(2): 27-33.
[43].KIM J K. Filtered cathodic arc source device operating system and filtered cathodic arc source operating method using the same: KR, 20210113801[P]. 2023-10-10.
[44].郎文昌, 刘俊红, 徐峰, 等. 一种旋转磁场导向沉积的真空镀膜设备及镀膜方法: CN, 20 2111507370.0[P]. 2022-04-12.
[45].赵栋才, 王启民, 郑军, 等. 一种线圈电磁挤压式磁过滤装置: CN, 202110744587.7[P]. 2022-08-02.
[46].杨素霞, 沈文卓. 基于智能复合镀膜设备的控制系统设计[J]. 真空, 2022, 59(1): 68-73.
[47].康豪. 基于Lab Windows/Cvi的真空镀膜设备控制系统开发[D]. 合肥: 中国科学技术大学, 2017.
[48].李敬. 真空离子镀膜设备的计算机监控系统的设计与实现[D]. 南昌: 南昌大学, 2021.
[49].SEVERIN J P, SEVERIJNS P A. In situ film thickness monitoring in CVD processes[J]. Journal of The Electrochemical Society, 2019, 137(4): 1306-1318.
[50].MAHMUDUR M R. On-line thin film thickness monitor by pulsed laser photo acoustics [J]. Optics and Lasers in Engineering, 2021, 139: 106481-106482.
[51].DONG S T, FU X H, LI C. Noble infrared optical thickness monitoring system based on the algorithm of phase-locked output current-reflectivity coefficient[J]. Coatings, 2022, 12(6): 782-789.
[52].杜昕, 付秀华, 董所涛, 等. 变量耦合动态监控光学膜厚补偿技术[J]. 中国光学, 2025, 18(3): 467-476.
[53].冯森, 陈新春, 邹梁, 等. 一种脉冲电弧离子镀膜的在线检测系统及方法: CN, 20241185 6739.2[P]. 2025-04-29.
[54].卢国英, 石昌仑, 柳军宁. 多弧离子镀用输送系统及多弧离子镀膜工艺: CN, 202211568 853.6[P]. 2023-04-04.
[55].王娜, 张晓, 孙彦波, 等. 一种内表面电弧离子镀的制备方法: CN, 202310552693.4[P]. 2023-10-20.
[56].秦工, 张江城, 邹丽. 自动调整离子束溅射角和入射角的离子镀装置及方法: CN, 20211 0892468.6[P]. 2023-07-25.
[57].贾工普. 大型多弧镀膜机[C]//中国机械工程学会. 1999年第二届表面工程国际会议论文集, 1999: 216-217.
[58].李国军, 罗志明, 李国栋, 等. 大型离子镀装饰膜镀膜设备与技术的新进展[C]//广东省真空学会. 广东省真空学会第五届会员代表大会暨2014年学术年会论文集, 2014: 32-37.
[59].孙博宇, 杨鹏, 韩文莉, 等. 一种用于超长叶片多弧离子镀膜的组合工装和方法: CN, 20 2410452796.8[P]. 2024-07-12.
[60].CHO S Y. Large-scale arc ion plating system: KR, 20240019409[P]. 2025-02-05.
[61].VETTER J, KUBOTA K, ISAKA M, et al. Characterization of advanced coating architectures deposited by an arc-HiPIMS hybrid process[J]. Surface and Coatings Technology, 2018, 350: 154-160.
[62].LI Z, QI G, XU Y C, et al. Preparation, microstructure and properties of FeCrAlTiSi high entropy alloy coatings using the combined technique of magnetron sputtering with multiarc ion plating[J]. Vacuum, 2025, 236: 114161-114172.
[63].HAE J S, DOH K L, HAN K K. Multicoated flexible indium tin oxide electrodes fabricated using magnetron sputtering and arc plasma ion plating for flexible perovskite solar cells[J]. ACS Applied Materials & Interfaces, 2024, 16(36): 1-10.
[64].武晨阳, 郭巧琴, 杨忠, 等. 火炮身管材料表面TiAlYN镀层组织及摩擦行为研究[J]. 装备环境工程, 2025, 22(1): 21-30.
[65].张权, 耿东森, 许雨翔, 等. 电弧/溅射复合沉积技术的发展及其在刀具涂层中的应用[J]. 表面技术, 2021, 50(5): 20-35, 101.
[66].XIE H Q, YU C T, CAI J, et al. Effect of the high-current pulsed electron beam irradiation on microstructure evolution and high temperature performance of arc ion plated Ni-20Co-28Cr-10Al- 0.5Y coating at 1373 K[J]. Surfaces and Interfaces, 2025, 62: 106149-106161.
[67].刘耿明, 宋国庆, 薛康辉, 等. Mo层对锆合金表面微熔NiCr涂层的抗高温氧化机理的影响[J]. 材料保护, 2024, 57(10): 11-18.
[68].RAM?REZ-REYNA F O, RODR?GUEZ-CASTRO G A, Figueroa-López U, et al. Effect of nitriding pretreatment on adhesion and tribological properties of AlCrN coating[J]. Materials Letters, 2021, 284: 128931-128934.
[69].祝绳健. 硬质合金表面纳米化基体/TiAlN膜层组织结构及其性能研究[D]. 赣州: 江西理工大学, 2021.
[70].张东波, 林松盛, 蔡伟通, 等. Cr-CrN-Cr-CrAlN多层膜对TC4钛合金力学性能的影响[J]. 材料保护, 2024, 57(7): 14-22.
[71].陆昆, 赵立军. NbN基陶瓷硬质薄膜研究现状与进展[J]. 电镀与精饰, 2023, 45(9): 55-63.
[72].MUSA M, MOUSA J, TAHERE E S, et al. Effect of layered architectural design on the tribological behaviour of AlTiN/AlTiCrN based cathodic arc evaporated physical vapour deposition coatings [J]. Metallurgical & Materials Transactions. Part A, 2025, 56(7): 2513-2536.
[73].杨通晗, 朱晖朝, 李福球, 等. 周期数对Ti/TiN/Zr/ZrN多层膜耐摩擦和耐腐蚀性能的影响[J]. 电镀与涂饰, 2025, 44(3): 103-111.
[74].WANG D, LIN S S, GONG Y H, et al. Solid particle erosion resistance of Cr-base gradient multilayer coatings[J]. Surface & Coatings Technology, 2020, 402: 126352-126360.
[75].林嵩. 梯度纳米TiSiCN涂层的强韧化行为与磨损腐蚀机理研究[D]. 鞍山: 辽宁科技大学, 2023.
[76].孙日, 王铁钢, 李伟, 等. Pt改性梯度NiCrAlY涂层的热腐蚀行为研究[J]. 材料保护, 2024, 57(3): 28-37, 49.
[77].SAINI H, KHATRI S M. A topical review on electrodeposited metal matrix nanocomposite coatings [J]. Journal of Electronic Materials, 2025, 54(8): 1-27.
[78].CHENG Y J, HAMILTON A, ODLYZKO M, et al. Thick graded interfaces increase wear resistance in Ti/TiN nanolayered thin films[J]. Thin Solid Films, 2025, 816: 140653-140661.

更新日期/Last Update: 2026-06-12