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[1]王晓丽,顾 海,周昭昌,等.铜镀层工艺参数优化的正交实验研究[J].电镀与精饰,2018,(12):19-25.[doi:10.3969/j.issn.1001?3849.2018.12.005]
 WANG Xiaoli,GU Hai,ZHOU Zhaochang,et al.Orthogonal Experimental Research on Optimization of Process Parameters of Copper Electroplating[J].Plating & Finishing,2018,(12):19-25.[doi:10.3969/j.issn.1001?3849.2018.12.005]
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铜镀层工艺参数优化的正交实验研究

参考文献/References:

[1] 刘志东. 特种加工(第2版)[M].北京:北京大学出版社, 2017: 5.
[2] 陈劲松, 黄因慧, 刘志东, 等. 喷射电沉积快速成形的定域性实验研究[J]. 中国机械工程, 2006, 17(13): 1408-1411.
[3] 范晖, 赵阳培, 王善奎. 射流电沉积工艺优化对铜镀层形貌及微观结构的影响[J]. 电镀与精饰, 2017, 39(8): 1-5.
[4] Grujicic D, Pesic B. Electrodeposition of copper: The nucleation mechanisms[J]. Electrochimica Acta, 2002, 47(18): 2901-2912.
[5] Grujicic D, Pesic B. Reaction and nucleation mechanisms of copper electrodeposition from ammoniacal solutions on vitreous carbon[J]. Electrochimica Acta, 2005, 50(22): 4426-4443.
[6] Radisic A, West A C, Searson P C. Influence of additives on nucleation and growth of copper on n-Si (111) from acidic sulfate solutions[J]. Journal of the Electrochemical Society, 2002, 149(2): C94-C99.
[7] Wu S, Yin Z, He Q, et al. Nucleation mechanism of electrochemical deposition of Cu on reduced graphene oxide electrodes[J]. The Journal of Physical Chemistry C, 2011, 115(32): 15973-15979.
[8] Jinsong C. Copper casting layer prepared by jet electroforming[J]. Materials Transactions, 2013, 54(8): 1528-1531.
[9] Lin C T, Lin K L. Effects of current density and deposition time on electrical resistivity of electroplated Cu layers[J]. Journal of Materials Science: Materials in Electronics, 2004, 15(11): 757-762.
[10] Ibanez A, Fatas E. Mechanical and structural properties of electrodeposited copper and their relation with the electrodeposition parameters[J]. Surface and Coatings Technology, 2005, 191(1): 7-16.
[11] Natter H, Hempelmann R. Nanocrystalline copper by pulsed electrodeposition: The effects of organic additives, bath temperature, and pH[J]. The Journal of Physical Chemistry, 1996, 100(50): 19525-19532.
[12] Grujicic D, Batric P. Electrodeposition of copper: The nucleation mechanisms[J]. Electrochimica Acta, 2002, 47(18): 2901-2912.
[13] Majidi M R, Asadpour-Zeynali K, Hafezi B. Reaction and nucleation mechanisms of copper electrodeposition on disposable pencil graphite electrode[J]. Electrochimica Acta, 2009, 54(3): 1119-1126.
[14] 马如龙, 彭超群, 王日初, 等. Cu-金刚石复合镀层的制备[J].中国有色金属学报, 2015, 25(12): 3414-3421.
[15] Chen H J, Chang S N, Tang C W. Application of the Taguchi method for optimizing the process parameters of producing lightweight aggregates by incorporating tile grinding sludge with reservoir sediments[J]. Materials, 2017, 10(11): 1294.
[16] Surace R, Filippis L A C D, Ludovico A D, et al. Application of Taguchi method for the multi-objective optimization of aluminium foam manufacturing parameters[J]. International Journal of Material Forming, 2010, 3(1): 1-5.
[17] Narayanan M K, Shashikala H D. Application of Taguchi method for optimization of process parameters of melt-quenching technique for microhardness[J]. Advanced Science Letters, 2016, 22(1): 250-252.
[18] Montgomery D C. Design and analysis of experiments, 8th edition[M]. Wiley, 2012.

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备注/Memo

收稿日期: 2018-09-26
修回日期: 2018-10-16
基金项目: 基金项目:江苏省先进材料功能调控技术重点实验室资助项目(JKLFCTAM1705);淮海工学院自然科学基金项目(Z2017007);江苏省3D打印装备及应用技术重点建设实验室(南通理工学院)开放基金资助项目(2018KFKT05);南通市3D打印技术及应用重点实验室资助项目(CP12016002);连云港市科技项目(CG1608);江苏省重点建设学科资助项目(苏教研〔2016〕9号)

更新日期/Last Update: 2018-12-31