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[1]王槐乾,姜宏伟,王方标,等.工艺参数对磁控溅射TiN膜结构的影响[J].电镀与精饰,2019,(12):20-24.[doi:10.3969/j.issn.1001-3849.2019.12.005]
 WANG Huaiqian,JIANG Hongwei,WANG Fangbiao,et al.The Effect of Process Parameters on the Structure of Magnetron Sputtering TiN Films[J].Plating & Finishing,2019,(12):20-24.[doi:10.3969/j.issn.1001-3849.2019.12.005]
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工艺参数对磁控溅射TiN膜结构的影响

参考文献/References:

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备注/Memo

收稿日期: 2019-06-16;修回日期: 2019-09-17
通信作者: 郑友进,email:zyjmsy@163.com
基金项目: 黑龙江省自然科学基金(LH2019E126);黑龙江省教育厅项目 (1352ZD002);牡丹江师范学院创新创业特色项目项目(CY2018020)

更新日期/Last Update: 2019-12-10