BAI Rui,WU Yingtong,LI Xiaoming,et al.Influence of Vacuum Annealing Temperature on Structure and Optical Properties of the Vanadium Oxide Films by Magnetron Sputtering[J].Plating & Finishing,2020,(11):25-28.[doi:10.3969/j.issn.1001-3849.2020.11.0060]
真空退火温度对磁控溅射氧化钒薄膜结构和光学性能的影响
- Title:
- Influence of Vacuum Annealing Temperature on Structure and Optical Properties of the Vanadium Oxide Films by Magnetron Sputtering
- Keywords:
- magnetron sputtering vanadium oxide thin film optical property vacuum annealing crystallization
- 文献标志码:
- A
- 摘要:
- 通过磁控溅射法在玻璃基底上制备氧化钒薄膜样品。由于沉积温度较低，薄膜样品呈非晶态且不透明。为使薄膜样品晶化，并有效抑制其过度氧化，将样品在管式真空炉中进行退火处理。本文重点研究了退火温度对薄膜结构和在可见至近红外波段光学性能的影响，退火温度的调节范围为300~550 ℃，退火时间固定为120 min。研究发现，随退火温度升高，薄膜样品的结晶度越好，当温度达到500 ℃时，薄膜样品结晶最好，薄膜基本由纯VO2相构成，且透光性能最好。随着退火温度进一步提高，薄膜中出现杂相，光学性能反而下降。
- Abstract:
- Vanadium dioxide thin film samples were prepared on glass substrates by magnetron sputtering. Due to the low deposition temperature, the thin film samples were amorphous and opaque. In order to crystallize the thin films and effectively inhibit their excessive oxidation, annealing treatment was carried out in a tubular vacuum furnace. This paper mainly studies the effects of annealing temperature on structure and optical properties in the visible and near-infrared range of the thin films. The annealing temperature is adjusted from 300-550 °C and the annealing time is kept for 120 min. It is found that the higher the annealing temperature, the better the crystallinity of the films. When the temperature reaches 500 °C, the films have the best crystallization, and the the films mainly consist of VO2, along with the highest light transmittance. As the annealing temperature further increases, impurity phase appeare in the films, which leads to decreasing optical properties.
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备注/Memo
收稿日期： 2020-04-29；修回日期： 2020-06-03
通信作者： 黄美东，mdhuang@tjnu.edu.cn
基金项目： 天津师范大学大学生创新创业项目（201810065346）