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[1]刘瑞霞*,朱福栋,由国艳.等离子体增强的磁控溅射TiSiN薄膜结构与耐蚀性[J].电镀与精饰,2021,(2):11-15.[doi:10.3969/j.issn.1001-3849.2021.02.0030]
 LIU Ruixia*,ZHU Fudong,YOU Guoyan.刘瑞霞*,朱福栋,由国艳[J].Plating & Finishing,2021,(2):11-15.[doi:10.3969/j.issn.1001-3849.2021.02.0030]
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等离子体增强的磁控溅射TiSiN薄膜结构与耐蚀性

参考文献/References:

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备注/Memo

收稿日期: 2020-04-21;修回日期: 2020-06-30
作者简介: 刘瑞霞(1982—),女,研究生,讲师。email: 84952497@qq.com
基金项目: 内蒙古自治区教育厅项目(NJZY18314)

更新日期/Last Update: 2021-02-10