[1]杜鑫,刘勇.控制电位脉冲电沉积法制备析氢Ni-S电极[J].电镀与精饰,2011,(11):40-43.
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控制电位脉冲电沉积法制备析氢Ni-S电极(
)
《电镀与精饰》[ISSN:1001-3849/CN:12-1096/TG]
- 卷:
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- 期数:
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2011年11
- 页码:
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40-43
- 栏目:
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- 出版日期:
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2019-06-08
文章信息/Info
- Title:
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Ni-S Electrode for Hydrogen Evolution Prepared by Controlled Potential Pulse Electro-deposition
- 作者:
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杜鑫; 刘勇
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内江师范学院化学化工学院
- 分类号:
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O646
- 摘要:
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采用控制电位脉冲电沉积法制备Ni-S合金电极,并在25%NaOH溶液中测试阴极极化曲线和交流阻抗,表征所制备电极的催化析氢活性。探讨了脉冲电流密度,脉冲限制电位及硫脲加入量对电沉积的影响,确定了电沉积制备Ni-S电极的适宜条件。结果显示:脉冲电流密度为7.1 A/dm2,脉冲电位上限为-0.70 V,脉冲电位下限为-1.75 V,V(瓦特镍溶液)(290 g/L NiSO4.6H2O,50 g/LNiCl2.6H2 O,40 g/L H3 BO3)与V(10%硫脲)比值为20∶8,制备的Ni-S电极具有最高的催化析氢性能。
- Abstract:
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Ni-S electrode was prepared by controlled potential pulse electro-deposition,then cathodic polarization curves and electrochemistry impedance were measured in 25% NaOH solution to analyze the electrode’s activity of catalytic hydrogen evolution.Effects of pulse current density,pulse limit potential and thiourea(TU) addition amount upon electro-deposition were discussed.Appropriate conditions of electro-deposition for Ni-S electrode preparation were determined.Results showed that when pulse current density was 7.1 A/dm2,upper limit of pulse potential was-0.70 V while the lower limit was-1.75 V,volume ratio of Watts Ni bath(290 g/L NiSO4·6H2O,50 g/L NiCl2·6H2O,40 g/L H3BO3)and TU(10%) was 20 ∶8,the Ni-S electrode prepared has the highest performance of catalytic hydrogen evolution.
备注/Memo
- 备注/Memo:
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四川省青年基金项目(07ZB044)
更新日期/Last Update:
2019-06-07