[1]吴双成*,储荣邦.六价铬镀铬理论发展概况[J].电镀与精饰,2020,(3):28-33.[doi:10.3969/j.issn.1001-3849.2020.03.006]
 WU Shuangcheng*,CHU Rongbang.Development of Hexavalent Chromium Plating Theory[J].Plating & Finishing,2020,(3):28-33.[doi:10.3969/j.issn.1001-3849.2020.03.006]
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六价铬镀铬理论发展概况()

《电镀与精饰》[ISSN:1001-3849/CN:12-1096/TG]

卷:
期数:
2020年3
页码:
28-33
栏目:
出版日期:
2020-03-15

文章信息/Info

Title:
Development of Hexavalent Chromium Plating Theory
作者:
吴双成1*储荣邦2
1.甘肃皋兰县胜利机械有限公司,甘肃 兰州 730299;2.南京虎踞北路4-6-501,江苏 南京 210013
Author(s):
WU Shuangcheng1* CHU Rongbang2
1.Gaolan victory machinery limited company of Gansu province Gaolan County, Lanzhou 730299, China; 2.Nanjing rests north road 4-6-501, Nanjing 210013, China
关键词:
镀铬理论霍尔理论氢键硫酸铬酰铬氧基六价铬
Keywords:
Chromium plating theory the Hoare Theory hydrogen bond chromium sulfate acyl chromium oxygen group hexavalent chromium
DOI:
10.3969/j.issn.1001-3849.2020.03.006
文献标志码:
A
摘要:
简述了几种镀铬理论的发展过程,对霍尔理论提出质疑,认为存在一个化学转化步骤,硫酸与铬酸反应生成硫酸铬酰,铬氧基是阴极放电离子。
Abstract:
The development process of several chrome theory is summarized, and the Hoare Theory is to be criticized. It is believed that there is a chemical reaction, which sulfuric acid reacted with chromic acid and then chromium sulfate acyl is generated. The chromium oxygen group is the discharge ion on the surface of the cathode.

参考文献/References:

[1] Hoare J P. On the mechanisms of chromium electrodeposition[J]. Journal of the Electrochemical Society, 1979, 126(2):190-199.
[2] Radnai T, Dorgai C. An X-ray diffraction study of the structure of di-and trichromate ions in solutions used for electrochemical chromium deposition[J]. Electrochimica Acta, 1992, 37(7):1239-1245.
[3] Udy M J. Chromium vol. l[M]. New York:Reinhold, 1956.
[4] Michel G, Machiroux R. Raman spectroscopic investigations of the CrO42-/Cr2O72- equilibrium in aqueous solution[J]. Journal of Raman Spectroscopy, 1983, 14(1):22-27.
[5] Michel G, Cahay R. Raman spectroscopic investigations on the chromium(VI) equilibria part 2+-species present, influence of ionic strength and CrO42--Cr2O72- equilibrium constant[J]. Journal of Raman Spectroscopy, 1986, 17(6):76-81.
[6] Kasper C. The structure of the chromic acid plating bath:the theory of chromium deposition[J]. Journal of Research of the National Bureau of Standards, 1932, 9: 353-375.
[7] Rogers R R. Studies in the theory of chromium electrodeposition[J]. Transactions of the Electrochemical Society, 1935, 68(1):391-415.
[8] Snavely C A. A theory for the mechanism of chromium plating:a theory for the physical characteristics of chromium plate[J]. Transactions of the Electrochemical Society, 1947, 92(1):537-577.
[9] Weiner R. Theory of electrolytic Chromium Deposition[J]. Metal Finishing, 1966, 64(3):46-49.
[10] Ogburn F, Brenner A. Experiments in chromium electrodeposition with radioastive chromium[J]. Journal of the Electrochemical Society, 1949, 96(6): 347-352.
[11] Latimer W M. Oxidation Potentials[M]. New York: Prentice Hall Inc., 1952.
[12] Udy M J. Chromium Vol. II: Metallurgy of Chromium and Its Alloys[M]. New York: Reinhold Publishing Corporation, 1956.
[13] Levitan J. Formation of polynuclear species during the electroreduction of chromic acid[J]. Journal of the Electrochemical Society, 1964, 111(3):286-289.
[14] Pourbaix M. Atlas of Electrochemical Equilibria in Aqueous Solutions[M]. Oxford: Pergamon Press, 1966.
[15] Coughlin J P. Contribution to the Data on Theoretical Metallurgy. XII. Heats and Free Energies of Formation of Inorganic Oxides[M]. Wasshington:United States Government printing office, 1954.
[16] Lowenheim F A. Modern Electroplating[M]. New York: Wiley, 1974.
[17] Hoare J P, Holden A H, Laboda M A. On the kinetics of high speed plating of chromium[J]. Plating and Surface Finishing, 1980, 67(3):42-46.
[18] 关山, 张琦, 胡如南. 电镀铬的最新发展[J]. 材料保护, 2000, 33(3):1-3.
[19] 安茂忠. 电镀理论与技术[M]. 哈尔滨:哈尔滨工业大学出版社, 2004.
[20] 曹经倩. 镍铬合金共沉积的电化学研究[J]. 材料保护, 1993, 26(1):11-15.
[21] Cotton F A, Wilkinson G. Advanced Inorganic Chemistry[M]. New York: John Wiley and Sons, 1966.
[22] Bennoune A, Durand B, Vittori O. Influence des ions chlorure sur la reduction electrochimique du chrome(VI)[J]. Electrochimica Acta, 1986, 31(7):831-835.
[23] 王先友, 蒋汉瀛, 郭炳昆. 非晶态铬镀液的电化学研究[J]. 材料保护, 1996, 29(7):1~3.
[24] 申泮文, 车云霞, 罗裕基, 等. 无机化学丛书第八册-钛分族钒分族铬分族[M]. 北京:科学出版社, 2018.
[25] Guro V, Shluger M A, Khodzhaev O F, et al. On the role of ionic associates in chromium plating electrolyte[J]. Russian Journal of Electrochemistry, 1993, 9:20.
[26] 吴双成. 对电镀技术中几个问题的探讨[J]. 上海电镀, 1998, (4):17~20.
[27] 江琳才. 物理化学[M]. 北京:高等教育出版社, 1984.
[28] 胡信国, 李桂芝. 现代防护与装饰性电镀[M]. 哈尔滨:哈尔滨工业大学出版社, 1989.

备注/Memo

备注/Memo:
收稿日期: 2019-04-08;修回日期: 2019-11-23
通信作者: 吴双成,wu-shuangcheng@163.com
更新日期/Last Update: 2020-03-10