[1]张 金*,刘玉岭,闫辰奇.氧化剂对铝栅化学机械抛光的影响[J].电镀与精饰,2020,(1):18-21.[doi:10.3969/j.issn.1001-3849.2020.01.004]
　ZHANG Jin*,LIU Yuling,YAN Chenqi.Effect of Oxidant on Chemical Mechanical Polishing of Aluminium Grids[J].Plating & Finishing,2020,(1):18-21.[doi:10.3969/j.issn.1001-3849.2020.01.004]
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氧化剂对铝栅化学机械抛光的影响()

《电镀与精饰》[ISSN:1001-3849/CN:12-1096/TG]

卷:
期数:
2020年1
页码:
18-21
栏目:
出版日期:
2020-01-15

文章信息/Info

Title:
Effect of Oxidant on Chemical Mechanical Polishing of Aluminium Grids
作者:
张 金1*; 刘玉岭2; 闫辰奇3
1. 唐山学院，河北 唐山 063000； 2. 河北工业大学 电子信息工程学院 天津市电子材料与器件重点实验室，天津 300130； 3. 唐山师范学院，河北 唐山 063000
Author(s):
ZHANG Jin1*;  LIU Yuling2;  YAN Chenqi3
1. Tangshan University, Tangshan 063000, China; 2. Tianjin Key Laboratory of Electronic Materials and Devices, School of electronic and information engineering, Hebei University of Technology, Tianjin 300130, China; 3. Tangshan Normal University, Tangshan 063000, China
关键词:
CMP; 去除速率; 铝栅; 表面粗糙度; 氧化剂
Keywords:
CMP;  removal rate;  aluminum grids;  surface roughness;  oxidant
DOI:
10.3969/j.issn.1001-3849.2020.01.004
文献标志码:
A
摘要:
氧化剂作为抛光液的组成成分，在铝栅化学机械抛光（CMP）中起到直接影响去除速率和表面粗糙度的重要作用。本文研究了氧化剂浓度对去除速率、表面粗糙度、电化学特性的影响，采用原子力显微镜和CHI600E电化学工作站，分别测量了材料的表面粗糙度和腐蚀电位。结果表明，去除速率与氧化剂浓度有关，表面粗糙度与通过氧化反应生成的氧化层有关，当氧化剂达到15 mL/L时，去除速率可达到1700 nm/min，表面粗糙度为4.6 nm。
Abstract:
As a component of polishing fluid, oxidant plays an important role in the chemical mechanical polishing (CMP) of aluminum grids, which directly affects the removal rate and surface roughness. In this paper, effects of oxidant concentration on the removal rate, surface roughness and electrochemical characteristics were studied. Surface roughness and corrosion potential of materials were measured by atomic force microscopy and CHI600E electrochemical workstation. The results showed that the removal rate was related to the oxidant concentration, while the surface roughness was related to the oxidation layer generated by the oxidation reaction. When the oxidant concentration reached 15 mL/L, the removal rate could reach 1700 nm/min and the surface roughness was 4.6 nm.

参考文献/References:

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备注/Memo

备注/Memo:
收稿日期： 2019-07-18；修回日期： 2019-08-14
通信作者： 张金， email: zhangjin19860406@163.com
基金项目： 国家中长期科技发展规划02科技重大专项资助项目（2009ZX02308）；唐山市科技计划项目（17110225a）；唐山学院博士创新基金资助项目（tsxybc201805）；唐山师范学院博士基金项目（2018A02）；唐山市科技计划应用基础研究项目（18130231a）。
更新日期/Last Update: 2020-01-10