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[1]卿启新*,黄炎光,王 晨,等.氯离子在局部电化学中对铜电沉积的影响[J].电镀与精饰,2024,(7):91-98.[doi:10.3969/j.issn.1001-3849.2024.07.014]
 Qing Qixin*,Huang Yanguang,Wang Chen,et al.Effect of chloride ions on copper electrodeposition in local electrochemistry[J].Plating & Finishing,2024,(7):91-98.[doi:10.3969/j.issn.1001-3849.2024.07.014]
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氯离子在局部电化学中对铜电沉积的影响

参考文献/References:



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备注/Memo

收稿日期: 2023-10-14 修回日期: 2023-11-06 作者简介: 卿启新( 1981.8 —),男,博士,讲师, email : 616096609@qq.com 基金项目: 惯性测量阵列常值误差在线补偿方法研究(国家自然科学基金 62363001 );局部电化学电沉积制造金属三维微结构(广西科技大学博士基金 22Z30 )。

更新日期/Last Update: 2024-07-09