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[1]熊立双,刘 阳,胡耀芳,等.适用于硅通孔的超薄聚甲基丙烯酸薄膜表面化学镀镍研究[J].电镀与精饰,2020,(3):34-38.[doi:10.3969/j.issn.1001-3849.2020.03.007]
 XIONG Lishuang,LIU Yang,HU Yaofang,et al.Electroless Nickel Deposition on Ultrathin Poly(methylacrylic acid) Film for Through Silicon via Application[J].Plating & Finishing,2020,(3):34-38.[doi:10.3969/j.issn.1001-3849.2020.03.007]
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适用于硅通孔的超薄聚甲基丙烯酸薄膜表面化学镀镍研究

参考文献/References:

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[2] Liu Y, Dong M, Wang T, et al. Design of thermally stable insulation film by radical grafting poly(methylacrylic acid) on silicon surface [J]. Applied Surface Science, 2019, 464: 627-635.
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[5] Li L, Ma Y, Gao G, et al. Pretreatment and deposition process of electroless Ni plating on polyimide film for electronic field applications [J]. Colloids and Surfaces A: Physicochemical and Engineering Aspects, 2015, A477: 42-48.
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备注/Memo

收稿日期: 2019-09-19;修回日期: 2019-10-12
通信作者:杭弢,hangtao@sjtu.edu.cn
基金项目: 国家自然科学基金项目(21972091);国家重点基础研究发展计划(973)项目(2015CB057200)

更新日期/Last Update: 2020-03-10