[1]严 森,李 爽,洪 明.doi: 10.3969/j.issn.1001-3849.2026.02.008烯丙基磺酸钠对VLP铜箔表面电镀镍层性能的影响[J].电镀与精饰,2026,(02):69-74.
 YAN Sen,LI Shuang,HONG Ming.Effects of sodium allylsulfonate on performance of nickel-plating layer on VLP copper foil surface[J].Plating & Finishing,2026,(02):69-74.
点击复制

doi: 10.3969/j.issn.1001-3849.2026.02.008烯丙基磺酸钠对VLP铜箔表面电镀镍层性能的影响()

《电镀与精饰》[ISSN:1001-3849/CN:12-1096/TG]

卷:
期数:
2026年02
页码:
69-74
栏目:
出版日期:
2026-02-28

文章信息/Info

Title:
Effects of sodium allylsulfonate on performance of nickel-plating layer on VLP copper foil surface
作者:
严 森12李 爽12洪 明12
(1. 江西铜业集团有限公司,江西 南昌 330096 ;2. 江西铜业技术研究院有限公司,江西 南昌 330096)
Author(s):
YAN Sen12 LI Shuang12 HONG Ming12
(1. Jiangxi Copper Corporation Co., Ltd., Nanchang 330096, China; 2. Jiangxi Copper Technology Research Institute Co., Ltd., Nanchang 330096, China)
关键词:
烯丙基磺酸钠电镀镀层性能
Keywords:
sodium allylsulfonate plating nickel coating performance
分类号:
TQ153
文献标志码:
A
摘要:
结合SEM、XRD、电化学阻抗谱(EIS)和结合力测试分析了烯丙基磺酸钠(SAS)对超低轮廓(VLP)铜箔镀镍层的微观形貌、晶粒取向、耐蚀性及结合力的影响机理。结果表明:在镀镍过程中,SAS主要对Ni2+的沉积有一定的抑制作用。当SAS添加量为0.6 g/L时,VLP铜箔镀镍层具有较好耐蚀性和结合力,其膜层电阻可达986.6 Ω?cm2,结合力能提高至5B级。适量添加SAS有助于提高VLP铜箔镀镍层的综合性能,其主要归因于SAS可一定程度地降低镍晶粒的形成速率,从而达到细化镍晶粒,提升镀层均匀性的效果。
Abstract:
The specific influence mechanism of sodium allylsulfonic (SAS) on the micro-morphology, grain orientation, corrosion resistance and adhesion of nickel-plating layer on very low profile (VLP) copper foil were analyzed by SEM, XRD, electrochemical impedance spectroscopy (EIS) and adhesion test. The results show that during the nickel plating process, SAS mainly has a certain inhibitory effect on the deposition of Ni 2+. When the addition amount of SAS is 0.6 g/L, the nickel plating layer of VLP copper foil has better corrosion resistance and adhesion. The film resistance can reach 986.6 Ω?cm2, and the adhesion can be improved to grade 5B. Adding an appropriate amount of SAS helps to improve the overall performance of the VLP copper foil nickel plating layer. This is mainly attributed to the fact that SAS can to some extent reduce the formation rate of nickel grains, thereby achieving the effect of refining the nickel grains and enhancing the uniformity of the plating layer

参考文献/References:

[1].周文木, 胡智宏. 电解铜箔在印制电路板端的评估方法研究[J]. 印制电路信息, 2021, 29(12): 6-12.
[2].祝大同. 印制电路板用高端电子铜箔及其技术新发展(上)[J]. 印制电路信息, 2022, 30(3): 10-16.
[3].王帅. 我国电解铜箔技术现状与趋势前瞻[J]. 有色金属加工, 2023, 52(1): 9-11.
[4].彭永忠, 刘圣林. PCB甩线、铜皮分层缺陷的成因分析[J]. 铜业工程, 2011(6): 51-54, 58.
[5].王海振, 胡旭日, 王维河, 等. 电解铜箔生产中电镀铬与电镀镍钼合金的性能对比[J]. 电镀与涂饰, 2014, 33(12): 506-509, 543.
[6].王妮. 一种电镀镍磷合金的添加剂和电镀工艺: 中国, 118727069?A [P]. 2024-10-01.
[7].CHOI Y. Preparation of electroformed copper-nickel multi-nano-layers and characterization of their electromagnetic shielding effectiveness[J]. Korean Journal of Metals and Materials, 2020, 58: 639-644.
[8].吴敏娴, 张然, 明智耀, 等. 硫脲对复合添加剂体系电解制备超低轮廓电解铜箔性能的影响[J]. 电镀与精饰, 2025, 47(3): 77-82.
[9].凌羽, 卢伟伟, 宋克兴, 等. 低轮廓电解铜箔表面微细粗化工艺研究[J]. 精密成形工程, 2024, 16(7): 173-181.
[10].徐建平, 杨帆, 郭立功. 超低轮廓度电解铜箔添加剂应用研究[J]. 中国金属通报, 2020(5): 85-86.
[11].谢幸秦, 周龙, 李延伟, 等. 中性电镀镍工艺探索研究[J]. 化工技术与开发, 2018, 47(2): 18-22.
[12].周小琴. 光亮电镀镍添加剂的研究[J].铸造技术, 2008(7): 955-958.
[13].李延伟, 尚雄, 姚金环, 等. 糖精对柠檬酸盐中性电镀镍影响的研究[J]. 电镀与精饰, 2013, 35(9): 43-46.
[14].王焱, 董玉坤, 李瑞基, 等. 高效液相色谱法测定镍镀液中的糖精钠和苯亚磺酸钠[J]. 分析测试技术与仪器, 2022, 28(1): 103-107.
[15].梁骏逸, 邹金成, 李林, 等. 马来酸酐与烯丙基磺酸钠共聚物的聚合过程及阻垢性能[J]. 油田化学, 2024, 41(2): 335-342.
[16].王记莲, 项东升, 申宏丹. 烯丙基磺酸钠改性CPP的制备研究与应用[J]. 化工技术与开发, 2016, 45(8): 6-8, 41.
[17].冯拉俊, 樊菊红, 雷阿利. 电镀镍组合添加剂研究[J]. 贵金属, 2006(3): 30-34.
[18].丁耀, 罗雪芳, 刘定富. 基于Box-Behnken试验设计的电沉积Ni-W-B合金镀层添加剂的制备[J]. 表面技术, 2022, 51(12): 178-187, 216.
[19].张守华, 张友亮, 邓志伟. 镀液添加剂对镀层内应力影响的研究[J]. 化工管理, 2021(6): 85-86.

相似文献/References:

[1]王晓丽,顾 海,周昭昌,等.铜镀层工艺参数优化的正交实验研究[J].电镀与精饰,2018,(12):19.[doi:10.3969/j.issn.1001?3849.2018.12.005]
 WANG Xiaoli,GU Hai,ZHOU Zhaochang,et al.Orthogonal Experimental Research on Optimization of Process Parameters of Copper Electroplating[J].Plating & Finishing,2018,(02):19.[doi:10.3969/j.issn.1001?3849.2018.12.005]
[2]王 秀.电镀智能监控系统设计[J].电镀与精饰,2018,(12):30.[doi:10.3969/j.issn.1001?3849.2018.12.007]
 WANG Xiu.Design of Intelligent Electroplating Monitoring System[J].Plating & Finishing,2018,(02):30.[doi:10.3969/j.issn.1001?3849.2018.12.007]
[3]王明亮,杨海燕,李 明,等.电镀硬金的研究现状[J].电镀与精饰,2019,(11):26.[doi:10.3969/j.issn.1001-3849.2019.11.007]
 WANG Mingliang,YANG Haiyan,LI Ming,et al.Research Progress on Hard Gold Electrodeposition[J].Plating & Finishing,2019,(02):26.[doi:10.3969/j.issn.1001-3849.2019.11.007]
[4]刘 光*,文 桦,徐启杰.基于TIA和PLC的全自动ABS塑料电镀控制系统设计[J].电镀与精饰,2020,(2):33.[doi:10.3969/j.issn.1001-3849.2020.02.007]
 LIU Guang*,WEN Hua,XU Qijie.Design of Automatic Control System for ABS Plastics Electroplating Line Based on TIA and PLC[J].Plating & Finishing,2020,(02):33.[doi:10.3969/j.issn.1001-3849.2020.02.007]
[5]宋青员,何荣祥,陈朝会,等.高度梯度微纳结构的自动化电镀制备方法[J].电镀与精饰,2020,(7):23.[doi:10.3969/j.issn.1001-3849.2020.07.0050]
 SONG Qingyuan,HE Rongxiang,CHEN Chaohui,et al.Automated Electroplating for Gradient Height Micro-nano Structures Fabricating[J].Plating & Finishing,2020,(02):23.[doi:10.3969/j.issn.1001-3849.2020.07.0050]
[6]雷翔霄?,徐立娟,唐春霞.基于神经网络PID算法的镀液温度控制系统[J].电镀与精饰,2020,(8):39.[doi:10.3969/j.issn.1001-3849.2020.08.0080]
 LEI Xiangxiao,XU Lijuan,et al.Bath Temperature Control System Based on Neural Network PID[J].Plating & Finishing,2020,(02):39.[doi:10.3969/j.issn.1001-3849.2020.08.0080]
[7]范文俊,崔红兵,王 萌,等.从三价铬溶液电沉积非晶Cr-C镀层及其性能研究[J].电镀与精饰,2020,(12):37.[doi:10.3969/j.issn.1001-3849.2020.12.0080]
 FAN Wenjun,CUI Hongbing,WANG Meng,et al.Preparation and Performance Study of Amorphous Cr-C Coating Electrodeposited from Trivalent Chromium Solution[J].Plating & Finishing,2020,(02):37.[doi:10.3969/j.issn.1001-3849.2020.12.0080]
[8]薛迪杰*,陈 军,陈景召.基于ZigBee的电镀生产线温度集中监控系统[J].电镀与精饰,2021,(1):31.[doi:10.3969/j.issn.1001-3849.2021.01.0060]
 XUE Dijie*,CHEN Jun,CHEN Jingzhao,et al.Temperature Centralized Monitoring System of Electroplating Production Line Based on ZigBee[J].Plating & Finishing,2021,(02):31.[doi:10.3969/j.issn.1001-3849.2021.01.0060]
[9]王昱开*.不锈钢工具电镀金刚石工艺研究[J].电镀与精饰,2021,(3):6.[doi:10.3969/j.issn.1001-3849.2021.03.002]
 WANG Yukai*.王昱开*[J].Plating & Finishing,2021,(02):6.[doi:10.3969/j.issn.1001-3849.2021.03.002]
[10]杨航城,田海燕.工艺参数对电镀镍钴合金及其性能的影响[J].电镀与精饰,2021,(4):5.[doi:10.3969/j.issn.1001-3849.2021.04.002]
 YANG Hangcheng,TIAN Haiyan.Effect of Process Parameters on Electrodepositing Ni-Co Alloy and Its Properties[J].Plating & Finishing,2021,(02):5.[doi:10.3969/j.issn.1001-3849.2021.04.002]

更新日期/Last Update: 2026-02-09