WU Fang *,WANG Wei.Structure and Corrosion Resistance of Electroless Co-P and Co-Mo-P Thin Films[J].Plating & Finishing,2022,(4):7-10.[doi:10.3969/j.issn.1001-3849.2022.04.002]
化学镀Co-P和Co-Mo-P薄膜的结构与耐腐蚀性能
- Title:
- Structure and Corrosion Resistance of Electroless Co-P and Co-Mo-P Thin Films
- 关键词:
- Co-P 薄膜; Co-Mo-P 薄膜; 相结构; 耐腐蚀性能
- 分类号:
- TQ153
- 文献标志码:
- A
- 摘要:
- 采用化学镀技术制备 Co-Mo-P 薄膜，并制备 Co-P 薄膜作为对照。采用扫描电镜、 X 射线衍射仪和电化学工作站对薄膜的表面形貌、相结构和耐腐蚀性能进行表征与测试，结果表明： Co-P 和 Co-Mo-P 薄膜表面形貌相似，且都呈现（ 210 ）晶面择优取向。与 Co-P 薄膜相比， Co-Mo-P 薄膜的腐蚀电位正移约 23 mV ，腐蚀电流密度降低 60.5% ，电荷转移电阻提高 236.8 Ω ·cm 2 。 Co-Mo-P 薄膜表现出较好的耐腐蚀性能。
- Abstract:
- ： Co-Mo-P thin film was prepared by electroless plating ， and Co-P thin film was also prepared as a comparison. The surface morphology ， phase structure and corrosion resistance of the thin films were characterized by scanning electron microscopy ， X-ray diffractometer and electrochemical workstation. The results showed that the surface morphology of Co-P and Co-Mo-P films were similar ， and both showed a （ 210 ） crystal plane preferred orientation. The Co-Mo-P film showed better corrosion resistance compared with Co-P film ， the corrosion potential was increased about 23 mV ， corrosion current density was reduced by 60.5% ， charge transfer resistance increased by 236.8 Ω ·cm 2 .
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备注/Memo
收稿日期： 2021-03-12 修回日期： 2021-03-30 * 通信作者： 吴芳， email ： zhengzhou_0046@126.com