[1]郑利珊*.doi: 10.3969/j.issn.1001-3849.2025.10.009电流密度对氯金酸体系电沉积金层硬度的影响规律探讨[J].电镀与精饰,2025,(10):60-66.
　Zheng Lishan*.Study on the influence of current density on the hardness of electrodeposited gold layer based chloroauric acid system[J].Plating & Finishing,2025,(10):60-66.
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doi: 10.3969/j.issn.1001-3849.2025.10.009电流密度对氯金酸体系电沉积金层硬度的影响规律探讨()

《电镀与精饰》[ISSN:1001-3849/CN:12-1096/TG]

卷:
期数:
2025年10
页码:
60-66
栏目:
出版日期:
2025-10-31

文章信息/Info

Title:
Study on the influence of current density on the hardness of electrodeposited gold layer based chloroauric acid system
作者:
郑利珊1; 2*
(1. 郑州信息科技职业学院 建筑工程与智能建造学院,河南 郑州 450046 ;2. 河南开放大学 建筑工程与智能建造学院,河南 郑州 450046)
Author(s):
Zheng Lishan1; 2*
(1. School of Civil Engineering and Intelligent Construction, Zhengzhou Vocational College of Information Technology, Zhengzhou 450046, China; 2. School of Civil Engineering and Intelligent Construction, Henan Open University, Zhengzhou 450046, China)
关键词:
黄金; 电沉积; 电流密度; 第二相
Keywords:
gold;  electrodeposition;  current density;  the second phase
分类号:
TQ153.4
文献标志码:
A
摘要:
在氯金酸电沉积金体系的基础上，讨论了电流密度的变化对电沉积金层的影响，为氯金酸体系的改良提供了研究思路，为电沉积金层的强化提供了理论依据。以电流密度为单一变量，使用氯金酸体系进行了电沉积金实验。使用扫描电镜、X射线衍射仪、显微维氏硬度计对样品进行了测试。不同电流密度条件下，电沉积金层的宏观表现、沉积速度、沉积效率、晶粒尺寸、各晶面织构系数、微观形貌、维氏硬度值均会一定的差异。电流密度在1.0～2.0 A/dm2范围内变化，样品的各项特征有较小幅度的变化。电流密度为2.5 A/dm2时，电沉积效率最低，电沉积金层相比其它电流密度条件下有明显变化，高电流区出现了明显的粗糙现象，通过扫描电镜发现出现了明显的第二相共沉积，碳的共沉积使得样品的维氏硬度值高达130.20 HV0.1。
Abstract:
Based on the chloroauric acid gold electroplating system, this paper discusses the influence of current density on the electroplated gold layer. This discussion provides research ideas for the improvement of the chloroauric acid system and theoretical basis for strengthening the electroplated gold layer. With the current density as the single variable, the electrodeposition of gold experiment was carried out using the chloroauric acid system. The samples were tested using scanning electron microscope, X-ray diffractometer and micro Vickers hardness tester. Under different current density conditions, the macroscopic appearance, deposition rate, deposition efficiency, grain size, texture coefficient of each crystal plane, microstructure and Vickers hardness value of the electroplated gold layer will all show certain differences. When the current density is in the range of 1.0-2.0 A/dm2, the characteristics of the samples change slightly. When the current density is 2.5 A/dm2, the electrodeposition efficiency is the lowest, and the gold layer shows obvious changes compared with other current density conditions. Obvious roughness occurred in the highcurrent area. The appearance of the second phase co-deposition makes the Vickers hardness value as high as 130.20 HV0.1

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更新日期/Last Update: 2025-10-16