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[1]向 静,阮海波*,王 翀,等.添加剂竞争吸附机理研究及通孔电镀应用[J].电镀与精饰,2022,(11):85-90.[doi:10.3969/j.issn.1001-3849.2022.11.015]
 XIANG Jing,RUAN Haibo*,WANG Chong,et al.Study on Competitive Adsorption Mechanism of Additives and Its Application of Though Holes Plating[J].Plating & Finishing,2022,(11):85-90.[doi:10.3969/j.issn.1001-3849.2022.11.015]
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添加剂竞争吸附机理研究及通孔电镀应用

参考文献/References:



[1] Chen Y, He W, Chen X, et al. Plating uniformity of bottom-up copper pillars and patterns for IC substrates with additive-assisted electrodeposition[J]. Electrochimica Acta, 2014, 120(7): 293-301.

[2] Xiang J, Wang C, Chen Y, et al. Improving wettability of photo-resistive film surface with plasma surface modification for coplanar copper pillar plating of IC substrates[J]. Applied Surface Science, 2017, 411: 82-90.

[3] 李玖娟 , 陈苑明 , 朱凯 , 等 . 环氧树脂表面生成聚噻吩的研究及直接电镀应用 [J]. 电镀与精饰 , 2018, 40(5): 5-10.

[4] 冯叶琳 , 丁运虎 , 毛祖国 , 等 . 电气铜排镀锡层的防护性能研究 [J]. 材料保护 , 2021, 54(6): 112-116.

[5] Wang F. Bis-(3-sulfopropyl) disulfide acceleration of copper electrodeposition via molecular dynamics and quantum chemical calculations[J]. International Journal of Electrochemical Science, 2020, 4931-4943.

[6] Broekmann P, Fluegel A, Emnet C, et al. Classification of suppressor additives based on synergistic and antagonistic ensemble effects[J]. Electrochimica Acta, 2011, 56(13): 4724-34.

[7] 张志梁 , 张迎 . 钢铁基体无预镀直接强酸性镀铜工艺 [J]. 材料保护 , 2021, 54(7): 89-92.

[8] Cho S K, Kim M J, Koo H C, et al. Low-resistivity Cu film electrodeposited with 3-N,N-dimethylaminodithiocarbamoyl-1-propanesulfonate for the application to the interconnection of electronic devices [J]. Thin Solid Films, 2012, 520(6): 2136- 2141.

[9] 陈明 . 一种碳纤维表面化学镀铜方法 [J]. 材料保护 , 2020, 53(S1): 37-41.

[10] Chen T C, Tsai Y L, Hsu C F, et al. Effects of Brighteners in a copper plating bath on throwing power and thermal reliability of plated through holes[J]. Electrochimica Acta, 2016, 212:572-582.

[11] Dixit P, Miao J. Aspect-ratio-dependent copper electrodeposition technique for very high aspect-ratio through-hole plating [J]. Journal of the Electrochemical Society, 2006, 153(6): G552-G559.

[12] Dow W P, Chen H H, Yen M Y, et al. Through-hole filling by copper electroplating[J]. Journal of the Electrochemical Society, 2008, 155(12): D750-D757.

[13] Lefebvre M, Najjar E, Gomez L, et al. Next generation electroplating process for HDI microvia filling and through hole plating[C]//Proceedings of the International Microsystems, Packaging, Assembly & Circuits Technology Conference. Paris, Frances, 2008: 102-105.

[14] Yan J J, Chang L C, Lu C W, et al. Effects of organic acids on through-hole filling by copper electroplating[J]. Electrochimica Acta, 2013, 109(11): 1-12.

[15] Huang Q, Gyorgak R, Pak R. Electrochemical formation of free-standing 3D structures using injection of additives [J]. Journal of the Electrochemical Society, 2017, 164(12): D737-D743.

[16] Ji L, Wang S X, Wang C, et al. Improved uniformity of conformal through-hole copper electrodeposition by revision of plating cell configuration[J]. Journal of the Electrochemical Society, 2015, 162(12): D575-D583.

[17] Ji L, Wang C, Wang S, et al. Multiphysics coupling simulation of RDE for PCB manufacturing[J]. Circuit World, 2015, 41(1): 20-28.

[18] Xiang J, Wang S, Li J, et al. Electrochemical factors of levelers on plating uniformity of through-holes: simulation and experiments [J]. Journal of the Electrochemical Society, 2018, 165(9): E359-E365.

[19] Xiang J, Chen Y, Wang S, et al. Improvement of plating uniformity for copper patterns of IC substrate with multi-physics coupling simulation [J]. Circuit World, 2018, 150-160.

[20] Chiu Y D, Dow W P. Accelerator screening by cyclic voltammetry for microvia filling by copper electroplating[J]. Journal of the Electrochemical Society, 2013, 160(12): D3021-D3027.

[21] 罗斌 , 安茂忠 , 王成勇 , 等 . PCB 电镀中极化曲线的应用 [J]. 电镀与环保 , 2009, 29(1): 13-16.

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备注/Memo

收稿日期: 2020-03-03 修回日期: 2022-07-08 作者简介: 向静( 1990 —),女,讲师,博士, email : 20190017@cqwu.edu.cn * 通信作者: 阮海波 email : rhbcqu@aliyun.com 基金项目: 重庆市教育委员会科学技术研究项目( KJQN202101321 和 JQN202101306 );重庆市自然科学基金( 2022NSCQ-MSX2217 );中国电子科技集团公司第九研究所揭榜挂帅项目(编号: 2022SK-014 );重庆文理学院人才引进项目( R2019FDQ12 和 R2016DQ11 )?/html>

更新日期/Last Update: 2022-11-12