[1]卓健飞,何雨波,汪镇涛,等. Watts型镀钴体系电沉积工艺优化 [J].电镀与精饰,2023,(3):52-59.[doi:10.3969/j.issn.1001-3849.2023.03.008]
　Zhuo Jianfei,He Yubo,Wang Zhentao,et al.Optimization of cobalt electrodeposition process in Watts bath[J].Plating & Finishing,2023,(3):52-59.[doi:10.3969/j.issn.1001-3849.2023.03.008]
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Watts型镀钴体系电沉积工艺优化
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《电镀与精饰》[ISSN:1001-3849/CN:12-1096/TG]

卷:
期数:
2023年3
页码:
52-59
栏目:
出版日期:
2023-03-15

文章信息/Info

Title:
Optimization of cobalt electrodeposition process in Watts bath
作者:
（1.中国航发长江动力有限公司，湖南 岳阳 414001； 2.南昌航空大学 材料科学与工程学院， 江西 南昌330063）
Author(s):
（1.AECC Changjiang Engine Company Co. Ltd.， Yueyang 414001， China； 2.School of Materials Science and Engineering， Nanchang Hangkong University， Nanchang 330063， China）
关键词:
钴; 电沉积;  Watts 型; 工艺参数; 镀层硬度
Keywords:
cobalt ;  electrodeposition ;  Watts type ;  process parameter ;  coating hardness
分类号:
TG174.451
DOI:
10.3969/j.issn.1001-3849.2023.03.008
文献标志码:
A
摘要:
针对 Watts 型镀钴工艺，系统研究了 Co 2+ /H 3 BO 3 摩尔比、表面活性剂、 pH 、温度、电流密度等参数对镀层沉积速度、硬度及微观结构的影响规律，获得了较佳的 Watts 型镀钴工艺方案。结果表明：适当增加 Co 2+ 含量可以加快镀层沉积速度，但过高 Co 盐会使阴极极化度减小、镀层结晶粗大； Co 2+ /H 3 BO 3 摩尔比在 1.5 时， Co 2+ 的沉积电位较负、结晶更为细致。电流密度对镀层沉积速度影响最大，溶液 pH 值则显著影响镀层显微硬度；提高电流密度，镀层沉积加快，但镀层容易粗糙，电流密度可选择 4 A/dm 2 ；升高镀液 pH 值有助于获得细致镀层，但 pH ＞ 5 后镀液易出现沉淀；温度在 40 ℃ 时镀层沉积速度和硬度均较佳。在优化的 Watts 型镀钴体系下所得镀层呈灰白色，晶粒呈棱片状，表面平整光滑，镀层硬度为 320 HV ，沉积速度为 22 μ m/h 。 GH4169 合金表面施镀 60 μ m 厚的钴镀层，可以显著改善其耐磨性。
Abstract:
： The effects of Co 2+ /H 3 BO 3 molar ratio ， surfactant ， pH ， temperature and current density on the deposition rate ， hardness and microstructure of the coating were systematically studied ， and a better Watts type cobalt plating electroplating process was obtained. The results show that proper increase of Co 2+ content can increase the deposition rate of coating ， but too high content of cobalt salt may reduce the cathode polarization and make coarse crystal grains. The deposition potential of Co 2+ is more negative and the coating grains are finer when the molar ratio of Co 2+ /H 3 BO 3 is 1.5. The current density has the greatest influence on the deposition rate of coating ， but pH value of the solution significantly affects the coating hardness. If the current density is increased ， the deposition of the coating is accelerated ， but the coating is easy to be rough ， and the current density can be selected as 4 A/dm 2 . Increasing pH value of the bath helps to obtain a fine coating ， but the bath is prone to precipitation when pH > 5. Both the deposition rate and hardness of the coating are better when the temperature is 40 ℃. Under the optimized Watts cobalt plating system ， the obtained coating is smooth and gray-white ， the grains are prismatic ， the hardness of the coating is 320HV ， and the deposition rate is 22 μ m/h.The wear resistance of GH4169 alloy can be significantly improved by applying cobalt coating with the thickness of 60 μ m.

参考文献/References:



[1] 王猛 , 谭俊 , 吴迪 , 等 . 喷射电沉积技术制备 Co-Cr 3 C 2 复合镀层的工艺优化 [J]. 中国表面工程 , 2016, 29(4): 75-85.

[2] 于静 , 刘延川 , 于洪飞 . 超音频感应熔覆钴基涂层的组织与摩擦磨损性能 [J]. 材料保护 , 2021, 54(9): 1-6.

[3] 苑博旭 , 马春阳 , 张思栋 . 超声 - 射流电沉积 Ni/Co-TiN 纳米镀层的工艺参数优化及性能研究 [J]. 材料保护 , 2022, 55(5): 92-98, 133.

[4] Jung H, Alfantazi A. An electrochemical impedance spectroscopy and polarization study of nanocrystalline Co and Co-P alloy in 0.1 M H 2 SO 4 solution[J]. Electrochimica Acta, 2006, 51(8-9): 1806-1814.

[5] Chen T, Cavallotti P. Electroplated cobalt film for perpendicular magnetic recording medium[J]. Applied Physical Letter, 1982, 41: 205-207.

[6] 李宁 , 雷孙栓 , 王鸿建 , 等 . 钴基复合镀层的高温耐磨减摩性能 [J]. 宇航材料工艺 , 1996, 1: 17-21, 26.

[7] 李宁 , 雷孙栓 , 王鸿建 . 电镀低应力钴工艺 [J]. 电镀与环保 , 1996, 1: 4-6.

[8] 刘霁云 , 赵阳 , 董世运 , 等 . 镍钴合金镀层研究进展 [J]. 电镀与精饰 , 2017, 39(7): 21-25.

[9] 廖文英 , 邹忠利 , 曾华 , 等 . 电镀纯钴工艺的组成研究 [J]. 辽宁化工 , 2021, 50(12): 1763-1766.

[10] 倪修任 , 陈苑明 , 王翀 , 等 . 表面活性剂对电沉积钴析氢的影响研究 [J]. 电镀与精饰 , 2019, 41(4): 1-5.

[11] Hyie K M, Resali N A, Abdullah W N R, et al. Synthesis and characterization of nanocrystalline pure cobalt coating: effect of pH[J]. Procedia Engineering, 2012, 41: 1627-1633.

[12] Pan B, Yang Y, Zhang Y, et al. Effects of saccharin and tetramethylammonium bromide on the microstructure and microhardness of thick cobalt electrodeposits[J]. Surface and Coatings Technology, 2017, 329: 49-54.

[13] Zhang D, Chen Y, Su Y, et al. Additive-assisted cobalt electrodeposition as surface magnetic coating to enhance the inductance of spiral copper inductors[J]. Surfaces and Interfaces, 2022, 28: 101603.

[14] Su C, An M, Yang P, et al. Electrochemical behavior of cobalt from 1-butyl-3-methylimidazolium tetrafluoroborate ionic liquid[J]. Applied Surface Science, 2010, 256(16): 4888-4893.

[15] Toosinezhad A,Alinezhadfar M,Mahdavi S. Cobalt/graphene electrodeposits characteristics tribological behavior and corrosion properties[J]. Surface and Coatings Technology, 2020, 385: 125418.

[16] Alinezhadfar M, Abad S N K,Mozammel M. Multifunctional cobalt coating with exceptional amphiphobic properties: self-cleaning and corrosion inhibition[J]. Surface and Interfaces, 2020, 21:100744.

[17] 吴万伟 , 田宏建 . 镀镍溶液中硼酸作用机理的研究 [J]. 北京师范大学学报 ( 自然科学版 ), 1989, 2: 50-53.

[18] Mahdavi S, Allahkaram S R. Effect of bath composition and pulse electrodeposition condition on characteristics and microhardness of cobalt coatings[J]. Transactions of Nonferrous Metals Society of China, 2018, 28(10):2017-2027.

[19] 张银 , 康敏 , 李恒征 , 等 . Ni-Co-P 合金镀层显微硬度及其耐海水腐蚀性 [J]. 材料科学与工程学报 , 2021, 39(3): 384-392.

[20] 杨航城 , 田海燕 . 工艺参数对电镀镍钴合金及其性能的影响 [J]. 电镀与精饰 , 2021, 43(4): 5-10.

[21] 霍大勇 . 温度对电镀光亮镍影响分析 [J]. 电镀与精饰 , 2015, 37(6): 28-30.

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备注/Memo

备注/Memo:
收稿日期： 2022-07-23 修回日期： 2022-08-18 作者简介： 卓健飞（ 1970 —），女，高级工程师， email ： 357090895@qq.com 通信作者： 王帅星， email ： wsxxpg@126.com 基金项目： 中国航空发动机集团产学研合作项目（ HFZL2020CXY026 ）
更新日期/Last Update: 2023-02-20