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[1]刘文彦*,魏 媛,虞正鹏,等. 硫酸钴浓度对电沉积 Co-W-P 薄膜结构与磁性能的影响 [J].电镀与精饰,2023,(10):15-20.[doi:10.3969/j.issn.1001-3849.2023.10.003]
 Liu Wenyan? Wei Yuan,Yu Zhengpeng,Chen Huanhuan,et al.Effect of cobalt sulfate concentration on structure and magnetic performance of Co-W-P thin film[J].Plating & Finishing,2023,(10):15-20.[doi:10.3969/j.issn.1001-3849.2023.10.003]
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硫酸钴浓度对电沉积 Co-W-P 薄膜结构与磁性能的影响

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备注/Memo

收稿日期: 2022-10-25 修回日期: 2022-11-23 作者简介: 刘文彦( 1981 —),男,硕士研究生,副教授,主要研究方向为应用化学、功能薄膜等。 email : wenyan_liu000@163.com 基金项目: 湖北省教育厅基金项目( 2019JB323 )?/html>

更新日期/Last Update: 2023-10-07