PDF下载 分享
[1]胡佳琦,邱 爽,王亚妮,等. 二甲基亚砜有机溶液中Sb-Te薄膜热电材料的电沉积制备 [J].电镀与精饰,2023,(10):83-89.[doi:10.3969/j.issn.1001-3849.2023.10.014]
 Hu Jiaqi,Qiu Shuang,Wang Yani,et al.Electrolytic deposition of Sb-Te thin-film thermoelectric materials in DMSO organic solution[J].Plating & Finishing,2023,(10):83-89.[doi:10.3969/j.issn.1001-3849.2023.10.014]
点击复制

二甲基亚砜有机溶液中Sb-Te薄膜热电材料的电沉积制备

参考文献/References:



[1] Dharmaiah P, Lee K H, Song S H, et al. Enhanced thermoelectric performance of Bi 0.5 Sb 1.5 Te 3 composites through potential barrier scattering at heterogeneous interfaces[J]. Materials Research Bulletin, 2021, 133: 111023.

[2] Kim H S, Liu W S, Ren Z F. The bridge between the materials and devices of thermoelectric power generators[J]. Energy & Environmental Science, 2017, 10: 69-85.

[3] 徐庆 , 赵琨鹏 , 魏天然 , 等 . 热电材料的研究现状与未来展望 [J]. 硅酸盐学报 , 2021, 49(7): 1296-1305.

[4] 梁晶 , 周亮亮 , 李斌 , 等 . Sb 2 Te 3 量子点的制备、结构及红外性质研究 [J]. 红外与激光工程 , 2020, 49(1): 19-24.

[5] 郭燕红 . 碲化锑基低维材料的制备和物性研究 [D]. 乌鲁木齐 : 新疆大学 , 2017.

[6] 易文 , 赵永杰 , 王伯宇 , 等 . Sb 2 Te 3 基热电薄膜的研究进展 [J]. 硅酸盐学报 , 2021, 49(6): 1111-1124.

[7] 杨换丽 . 半导体热电材料 Bi-Sb 合金薄膜的电化学制备 [D]. 长沙 : 长沙理工大学 , 2012.

[8] 房博 . 碲化锑基纳米薄膜的制备及其热电性能研究 [D]. 上海 : 上海大学 , 2012.

[9] 穆武第 . 碲化铋基热电薄膜制备及其热电性能研究 [D]. 长沙 : 国防科学技术大学 , 2009.

[10] Zheng Z, Fan P, Lou J, et al. Thermoelectric properties of bismuth antimony tellurium thin films through bilayer annealing prepared by ion beam sputtering deposition[J]. Thin Solid Films, 2014, 562: 181-184.

[11] Noro H, Sato K, Kagechika H. The thermoelectric properties and crystallography of Bi-Sb-Te-Se thin films grown by ion beam sputtering[J]. Journal of Applied Physics, 1993, 73: 1252-1260.

[12] Venkatasubramanian R, Colpitts T, Watko E, et al. MOCVD of Bi 2 Te 3 ,Sb 2 Te 3 and their superlattice structures for thin-film thermoelectric applications[J]. Journal of Crystal Growth, 1997, 170(01-04): 817-821.

[13] 裘武军 . 电化学沉积法制备薄膜 Bi 2 Te 3 基热电材料 [D]. 杭州 : 浙江大学 , 2011.

[14] 郭涛 , 李硕 , 姚雅萱 , 等 . Bi-Te 基薄膜热电材料的研究进展 [J]. 材料导报 , 2022, 36(4): 135-147.

[15] 秦海旭 . Sb 2 Te 3 基热电材料的微结构调控与掺杂改性 [D]. 哈尔滨 : 哈尔滨工业大学 , 2021.

[16] 高然 , 吴庆港 , 雷乐乐 , 等 . n 型有机热电材料掺杂改性的研究进展 [J]. 材料导报 , 2022, 36(10): 204-214.

[17] 张自勤 , 牛斌娜 , 李豪杰 , 等 . 碲化铋基热电材料复合改性的研究进展 [J]. 电镀与精饰 , 2021, 43(11): 48-54.

[18] 朱新宏 . 溶剂热法合成 Sb 2 Te 3 基热电材料 [D]. 武汉 : 武汉理工大学 , 2007.

[19] Shi W, Liang Z, Son S, et al. Hydrothermal synthesis and thermoelectric transport properties of impurity-free antimony telluride hexagonal nanoplates[J]. Advanced Materials, 2010, 20(10): 1892-1897.

[20] 李菲晖 , 巩运兰 , 高镜涵 . 基材种类对 DMSO 体系中电沉积碲化铋薄膜热电材料的影响 [J]. 电镀与涂饰 , 2018, 37(12): 519-525.

相似文献/References:

[1]张冰怡,张莎莎*,姚正军,等.电沉积Ni-W纳米晶镀层制备与显微硬度研究[J].电镀与精饰,2019,(8):20.[doi:10.3969/j.issn.1001-3849.2019.08.005]
 ZHANG Bingyi,ZHANG Shasha*,YAO Zhengjun,et al.Preparation and Microhardness of Electrodeposited Ni-W Nanocrystalline Coatings[J].Plating & Finishing,2019,(10):20.[doi:10.3969/j.issn.1001-3849.2019.08.005]
[2]雷同鑫,鞠 辉,张长科,等.电镀Ni-W-P合金在钻杆接头上的应用[J].电镀与精饰,2019,(10):38.[doi:10.3969/j.issn.1001-3849.2019.10.009]
 LEI Tongxin,JU Hui,ZHANG Changke,et al.Application of Ni-W-P Alloy Prepared by Electroplating to Tool Joints[J].Plating & Finishing,2019,(10):38.[doi:10.3969/j.issn.1001-3849.2019.10.009]
[3]李晓峰*,孟 芳,董会超,等.电沉积法制备掺铋金属锌及其性能表征[J].电镀与精饰,2020,(1):12.[doi:10.3969/j.issn.1001-3849.2020.01.003]
 LI Xiaofeng*,MENG Fang,DONG Huichao,et al.Electrodeposited Preparation of Bi-Doped Metal Zinc and Its Performance Characterization[J].Plating & Finishing,2020,(10):12.[doi:10.3969/j.issn.1001-3849.2020.01.003]
[4]张永霞,王 玫,方 华*,等.Co3O4/碳纳米管复合膜的超级电容器性能[J].电镀与精饰,2020,(2):1.[doi:10.3969/j.issn.1001-3849.2020.02.001]
 ZHANG Yongxia,WANG Mei,FANG Hua*,et al.Co3O4/Carbon Nanotube Composite Film for Supercapacitor and Its Performances[J].Plating & Finishing,2020,(10):1.[doi:10.3969/j.issn.1001-3849.2020.02.001]
[5]侯珂珂,陈新华,张万强,等.电沉积法制备仿生超疏水滤网及其油水分离性能[J].电镀与精饰,2020,(4):1.[doi:10.3969/j.issn.1001-3849.2020.04.0010]
 HOU Keke,CHEN Xinhua,ZHANG Wanqiang,et al.Preparation of Biomimetic Superhydrophobic Filter Screen by Electrodeposition and the Oil-Water Separation Performance[J].Plating & Finishing,2020,(10):1.[doi:10.3969/j.issn.1001-3849.2020.04.0010]
[6]肖成龙,梁世雍,于兆勤*.可控阵列微柱超疏水表面实验研究[J].电镀与精饰,2020,(7):27.[doi:10.3969/j.issn.1001-3849.2020.07.0060]
 XIAO Chenglong,LIANG Shiyong,YU Zhaoqin*.Experimental Study on Superhydrophobic Surface of Controllable Array Microcolumns[J].Plating & Finishing,2020,(10):27.[doi:10.3969/j.issn.1001-3849.2020.07.0060]
[7]徐 超,王淼宇,周建波,等.电沉积Ni-Mo-Fe-La合金析氢电极的工艺研究[J].电镀与精饰,2020,(8):7.[doi:10.3969/j.issn.1001-3849.2020.08.0020]
 XU Chao,WANG Miaoyu,ZHOU Jianbo,et al.Study on Electrodeposition Process of Ni-Mo-Fe-La Alloy Hydrogen Evolution Electrode[J].Plating & Finishing,2020,(10):7.[doi:10.3969/j.issn.1001-3849.2020.08.0020]
[8]高 辉,刘伟杰*.2A12铝合金电沉积Ni-Co-MoS2复合镀层的耐磨性能研究[J].电镀与精饰,2020,(10):1.[doi:10.3969/j.issn.1001-3849.2020.10.0010]
 GAO Hui,LIU Weijie*.Research on Wear Resistance of Ni-Co-MoS2 Composite Coating Electrodeposited on 2A12 Aluminium Alloy[J].Plating & Finishing,2020,(10):1.[doi:10.3969/j.issn.1001-3849.2020.10.0010]
[9]王 羽,刘励昀,杜荣斌*,等.添加剂MPS、DDAC、Cl-对铜箔电沉积的影响[J].电镀与精饰,2021,(5):1.[doi:10.3969/j.issn.1001-3849.2021.05.001]
 WANG Yu,LIU Liyun,DU Rongbin*,et al.Effects of Additives MPS, DDAC and Cl- on the Copper Foil[J].Plating & Finishing,2021,(10):1.[doi:10.3969/j.issn.1001-3849.2021.05.001]
[10]杨惠良*.硫酸盐镀液中紫铜电沉积Ni-Co/WC复合镀层的工艺条件优化[J].电镀与精饰,2021,(6):30.[doi:10.3969/j.issn.1001-3849.2021.06.007]
 YANG Huiliang*.Optimization of Process Conditions for Electrodeposition of Ni-Co/WC Composite Coatings on Red Copper from Sulfate Bath[J].Plating & Finishing,2021,(10):30.[doi:10.3969/j.issn.1001-3849.2021.06.007]

备注/Memo

收稿日期: 2023-06-26 修回日期: 2023-07-10 作者简介: 胡佳琦( 2002 —),女,本科生, email : 3050584786@qq.com * 通信作者: 李菲晖, email : tjlifeihui@126.com 基金项目: 国家自然科学基金资助项目( 22005219 )

更新日期/Last Update: 2023-10-07