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[1]宋 进,李超谋,齐国栋,等.doi: 10.3969/j.issn.1001-3849.2025.03.005含氮杂环有机添加剂对线圈电感表面沉积钴层[J].电镀与精饰,2025,(03):34-38.
　Zhang Dongming,He Wei,Chen Yuanming*.Effect of nitrogen-heterocycle organic additiveson microstructure and properties of plating cobalt on surface of coil inductor Song Jin1, Li Chaomou1, Qi Guodong1, Pi Yiming2,3, Wang Cheng4, He Kehan4,[J].Plating & Finishing,2025,(03):34-38.
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doi: 10.3969/j.issn.1001-3849.2025.03.005含氮杂环有机添加剂对线圈电感表面沉积钴层

《电镀与精饰》[ISSN:1001-3849/CN:12-1096/TG] 卷: 期数: 2025年03 页码: 34-38 栏目: 出版日期: 2025-03-31
Title:
Effect of nitrogen-heterocycle organic additiveson microstructure and properties of plating cobalt on surface of coil inductor Song Jin1, Li Chaomou1, Qi Guodong1, Pi Yiming2,3, Wang Cheng4, He Kehan4,
作者:
宋 进1; 李超谋1; 齐国栋1; 皮亦鸣2;  3; 王 城4; 何科翰4; 张东明2; 何 为2; 陈苑明2*
微观结构及性能的影响宋 进1,李超谋1,齐国栋1,皮亦鸣2, 3,王 城4,何科翰4,张东明2,何 为2,陈苑明2(1. 珠海杰赛科技有限公司,广东 珠海 519175 ;2. 电子科技大学 材料与能源学院,四川 成都 610054 ;3. 电子科技大学 广东电子信息工程研究院,广东 东莞 523808 ;4. 西昌学院 理学院,四川 西昌 615013)
Author(s):
Zhang Dongming2;  He Wei2;  Chen Yuanming2*
(1. GCI Science & Technology (Zhuhai) Co., Ltd., Zhuhai 519175, China; 2. School of Materials and Energy, University of Electronic Science and Technology of China, Chengdu 610054, China; 3. Institute of Electronic and Information Engineering of UESTC in Guangdong, Dongguan 523808, China; 4. School of Science, Xichang University, Xichang 615013, China)
关键词:
电沉积钴; 微观形貌; 含氮杂环有机添加剂; 铜线圈电感
Keywords:
cobalt electrodeposition;  micromorphology;  nitrogen-heterocycle organic additives;  copper coil inductor
分类号:
TQ153.1
文献标志码:
A
摘要:
钴作为关键导体材料在集成电路中实现电路互连起着重要地位。本文采用量子化学计算、电化学测试和电沉积方法研究了咪唑、吡嗪、水杨醛肟3种含氮杂环的有机添加剂特性及其对电沉积钴的影响，采用扫描电子显微镜和接触角测试仪分析镀层形貌和表面润湿性。结果表明，3种含氮杂环有机添加剂通过在电极表面发生吸附对钴的电沉积起到抑制作用，其中吡嗪的抑制效果最强，单独使用3种含氮杂环有机添加剂的镀液体系下都未能获得致密平整的钴镀层。在铜线圈电感表面电沉积钴，可形成磁芯，有助于提升电感的电感值，在1 MHz时最高达到2.55 μH。
Abstract:
Cobalt as conductor material plays a significant role in realizing inter connection of integrated circuits. In this work, quantum chemistry calculation, electrochemical measurement and electrodeposition are employed to investigate the properties of nitrogen-heterocycle organic additives including imidazole, pyrazide and salicylaldoxime and their effects on electrochemical behavior in cobalt deposition. The morphology and surface wettability of deposits were analyzed by scanning electron microscope (SEM) and contact angle tester. The results showed that three kinds of nitrogen-heterocycle organic additives inhibited cobalt deposition via adsorption behavior on the electrode surface and pyrazide exhibited the best performance of inhibition, but dense and smooth deposits could not be obtained in the bath system with three additives alone. The formed magnetic cores of copper coil inductor leaded to remarkable performance improvements in the inductance value and the maximum reached 2.55 μH at 1 MHz

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更新日期/Last Update: 2025-03-18