[1]纪建超,颜 悦,哈恩华.doi: 10.3969/j.issn.1001-3849.2025.03.009沉积工艺对纳米Au薄膜内应力和微观结构的影响[J].电镀与精饰,2025,(03):60-66.
　Ji Jianchao,Yan Yue,Ha Enhua.Effect of deposition process on internal stress and microstructure of Au nanometer films[J].Plating & Finishing,2025,(03):60-66.
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doi: 10.3969/j.issn.1001-3849.2025.03.009沉积工艺对纳米Au薄膜内应力和微观结构的影响()

《电镀与精饰》[ISSN:1001-3849/CN:12-1096/TG]

卷:
期数:
2025年03
页码:
60-66
栏目:
出版日期:
2025-03-31

文章信息/Info

Title:
Effect of deposition process on internal stress and microstructure of Au nanometer films
作者:
纪建超; 颜 悦; 哈恩华
(北京航空材料研究院股份有限公司,北京 100095)
Author(s):
Ji Jianchao;  Yan Yue;  Ha Enhua
(Beijing Institute of Aviation Materials Co., Ltd., Beijing 100095, China)
关键词:
Au薄膜; 磁控溅射; 内应力; 显微结构; 光学性能
Keywords:
Au film;  magnetron sputtering;  internal stress;  microstructure;  optical properties
分类号:
TQ34
文献标志码:
A
摘要:
针对薄膜应力等原因造成的电子器件或光学器件失效，探索了沉积工艺与Au薄膜的显微结构和内应力的关系，目的在于通过工艺优化，提高薄膜质量并延长器件的使用寿命。采用直流脉冲磁控溅射方法沉积了Au薄膜，借助X射线衍射(XRD)仪、探针式表面轮廓分析仪、原子力显微镜(AFM)、分光光度计等表征手段, 分析了薄膜的结晶性能、内应力、显微结构和光学性能；研究了沉积功率等参数对Au薄膜的结构、力学性能、光学性能的影响。结果表明，所沉积的Au薄膜为(111)晶面择优生长的织构结构。随沉积功率的增加，Au薄膜生长速率接近于线性增加；薄膜为柱状晶结构，且随沉积功率增加，Au薄膜的结晶能力衰减，晶粒尺寸递减；薄膜表面粗糙度Ra随薄膜沉积功率出现先降低后升高的趋势；随沉积功率增加，沉积的Au薄膜可见光透过率呈下降趋势，然后趋于稳定；所沉积的Au薄膜表现为张应力，随沉积功率的增加，薄膜的内应力变大。分析研究结果可知，沉积功率1 kW为最优工艺。
Abstract:
In view of the failure of electronic or optical devices caused by thin film stress, the relationship between the deposition process and the microstructure and internal stress of Au thin films was explored in order to improve the quality of thin films and prolong the service life of devices through process optimization. The method of DC pulse magnetron sputtering was used to deposit Au film. The crystallization properties, internal stress, microstructure and optical properties of the film were analyzed by means of X-ray diffraction (XRD) probe surface profile analyzer, atomic force microscope (AFM), spectrophotometer and other characterization methods. The effect of deposition power and other parameters on the structure, mechanical properties and optical properties of Au film was studied. The results show that the deposited Au film has a texture structure of optimal growth on (111) crystal plane, and the growth rate of Au film increases linearly with the increase of deposition power. The film is columnar crystal structure, the crystallization capacity of Au film attenuates and the grain size decreases with the increase of deposition power. The surface roughness Ra of the film decreases first and then increases with the deposition power. With the increase of deposition power, the visible light transmittance of the deposited Au films decreases and then becomes stable. The deposited Au films showed tensile stress, and the internal stress of the films increase with the increase of deposition power. The research results indicate that the deposition power of 1 kW is the best process.

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更新日期/Last Update: 2025-03-18