[1]李明旭*,李 欣,郭巧琴,等.doi: 10.3969/j.issn.1001-3849.2025.08.002磁控溅射铝薄膜的组织与性能研究[J].电镀与精饰,2025,(08):9-15.
 Li Mingxu *,Li Xin,Guo Qiaoqin *,et al.Study on the microstructure and properties of Al films prepared by magnetron sputtering[J].Plating & Finishing,2025,(08):9-15.
点击复制

doi: 10.3969/j.issn.1001-3849.2025.08.002磁控溅射铝薄膜的组织与性能研究()

《电镀与精饰》[ISSN:1001-3849/CN:12-1096/TG]

卷:
期数:
2025年08
页码:
9-15
栏目:
出版日期:
2025-08-31

文章信息/Info

Title:
Study on the microstructure and properties of Al films prepared by magnetron sputtering
作者:
李明旭1*李 欣2郭巧琴2齐源昊2雷 雨1
(1. 西安中核核仪器股份有限公司,陕西 西安 710061 ;2. 西安工业大学 材料与化工学院,陕西 西安 710032)
Author(s):
Li Mingxu1 * Li Xin2 Guo Qiaoqin2 * Qi Yuanhao2 Lei Yu1
(1. CNNC Xian Nuclear Instrument Co., Ltd., Xian 710061, China; 2. School of Materials Science and Chemical Engineering, Xian Technological University, Xian 710032, China)
关键词:
PET磁控溅射沉积时间Al薄膜挡光性射线透过率
Keywords:
PET magnetron sputtering deposition time Al films light-blocking property ray transmittance
分类号:
TB79
文献标志码:
A
摘要:
核辐射探测器窗口所用材料聚对苯二甲酸乙二醇酯(PET)的厚度仅2 μm,材料质软、熔点低且表面张力较大,在其表面采用磁控溅射技术沉积纳米铝膜极其困难,目前该产品主要依赖进口。针对这一问题,本文采用磁控溅射离子镀技术在PET表面制备铝膜,采用扫描电子显微镜、原子力显微镜和X射线衍射仪观察和分析了铝薄膜的微观形貌及物相组成,采用划格法定性检测了铝薄膜与PET基体之间的结合力,并使用紫外—可见分光光度计和核辐射探测器分别表征了镀铝薄膜的挡光性和射线粒子的透过率。结果表明:Al晶粒为纳米晶、结晶细小致密,铝薄膜与PET基体结合紧密;随着沉积时间的增加,Al晶粒尺寸先增加后趋于稳定,铝薄膜的厚度先增大后减小。铝薄膜的挡光性、α、β粒子的平均透过率先提高后降低;当沉积时间为20 min时,铝薄膜的厚度最大为60.29 nm,光透过率最低为0.002%,α、β粒子平均透过率最高,分别为589.8 CPS和567.5 CPS。
Abstract:
The material used for the window of the nuclear radiation detector, polyethylene terephthalate (PET), has a thickness of only 2 μm. This material is soft, has a low melting point, and has a high surface tension. It is extremely difficult to deposit nano-aluminum films on its surface using magnetron sputtering technology. Therefore, currently, this product mainly depends on imports. In response to this issue, the Al film was deposited on the surface of PET by magnetron sputtering ion plating technology in this research. The microstructure and phase composition of the aluminum film were observed and analyzed using scanning electron microscopy, atomic force microscopy, and X-ray diffraction. The binding force between the aluminum film and the PET substrate was qualitatively detected using the scribing method, and the light blocking properties and X-ray particle transmittance of the aluminum coated film were characterized using ultraviolet-visible spectrophotometer and nuclear radiation detector, respectively. The result shows that the aluminum grains are nano crystals with fine and dense crystallization, and the aluminum films are closely combined with the PET substrate. With the increase of deposition time, the grain size of aluminum first increases and then tends to stabilize. Meanwhile, the thickness of the aluminum films first increases and then decreases. Moreover, the light-blocking property of the aluminum films and the average transmittance rates of α and β particles first increases and then decreases. When the deposition time is 20 min, the maximum thickness of the Al films is 60.29 nm, the lowest light transmittance is 0.002%, and the average transmittance of α and β particles is the highest, with the values being 589.8 CPS and 567.5 CPS respectively

参考文献/References:

[1].木易. 核辐射的危害有多大[J]. 生命与灾害, 2017(2): 26-27.
[2].冯子雅, 杨小勇, 陈群, 等. 核辐射防护原则—内外兼防[J]. 山东工业技术, 2019(8): 245.
[3].Krishno C, Ram P, Chandra D H, et al. A review on radionuclide pollution in global soils with environmental and health hazards evaluation[J]. Environmental Geochemistry and Health, 2023, 45(12): 9245-9266.
[4].张烨, 闫平. 国内辐射监测仪表发展探讨[J]. 产业与科技论坛, 2018, 17(16): 101-102.
[5].李占双. 西安核仪器厂—书写核仪器耀眼篇章[J]. 中国核工业, 2015(3): 50-52.
[6].Pino F, Fontana C L, Delgado J, et al. Characterization of a medium-sized CLLB scintillator: single neutron/gamma detector for radiation monitoring[J]. Journal of Instrumentation, 2021, 16(11):11034.
[7].Srivastavav S, Mitra P, Singh S K, et al. Investigation of a SiPM-GGAG: Ce, B scintillator detector for environmental gamma radiation monitoring[J]. Journal of Instrumentation, 2022, 17(3): T03001.
[8].曹保锋, 宋立军, 肇文丽, 等. 一种α、β射线探测器: 中国, CN201410065825.1[P]. 2017-10-27.
[9].赵丹, 梁庭, 林立娜, 等. 磁控溅射法低温制备Al膜工艺参数的优化[J]. 微纳电子技术, 2017, 54(12): 852-857, 870.
[10].Khachatryan H, Lee S, Kim K, et al. Al thin film: The effect of substrate type on Al film formation and morphology[J]. Journal of Physics and Chemistry of Solids, 2018, 122: 109-117.
[11].李振宇, 范宇峰, 刘铖, 等. 国产超薄双面镀铝聚酯薄膜的工艺改进和热物性研究[J]. 表面技术, 2018, 47(9): 219-222.
[12].李兆营. 功率对直流磁控溅射氧化钒薄膜电学性能的影响[J]. 电镀与精饰, 2023, 45(4): 45-50.
[13].徐文慧, 刘杰, 袁志响, 等. 磁控溅射法制备氧化锆涂层及其绝缘性能研究[J]. 电镀与精饰, 2023, 45(7): 68-73.
[14].汪中祥, 李永荃. 等离子体预处理对BOPET镀铝膜镀铝层附着性能的影响研究[J]. 安徽科技, 2021, (7): 45-46.
[15].张以忱. 第二十一讲真空卷绕镀膜[J]. 真空, 2021, 58(5): 110-112.
[16].Jiang H, Zhu J, Huang Q, et al. The influence of residual gas on boron carbide thin films prepared by magnetron sputtering[J]. Applied Surface Science, 2011, 257(23): 9946-9952.
[17].赵印中, 许旻, 李林, 等. 磁控溅射法制备高反射铝膜[J]. 真空与低温, 2008(3): 164-166.
[18].钟志有, 周金, 杨玲玲. 溅射时间对掺镓氧化锌透明导电薄膜特性的影响[J]. 中南民族大学学报(自然科学版), 2011, 30(3): 34-37.
[19].Ulises B V, Marcelo S O. Morphological and structural characterization of magnetron-sputtered aluminum and aluminum-boron thin films[J]. Crystals, 2021, 11(5): 492.
[20].韦春贝, 代明江, 高阳, 等. AZ91D镁合金磁控溅射镀铝膜及其化学转化后的耐蚀性[J]. 电镀与涂饰, 2012, 31(4): 30-33.
[21].Khachatryan H, Lee S N, Kim K B, et al. Al thin film: The effect of substrate type on Al film formation and morphology[J]. Journal of Physics and Chemistry of Solids, 2018, 122: 109-117.
[22].李海兵, 徐勇军, 蔡其文, 等. 太阳能高反射薄膜制备技术对薄膜性能的影响[J]. 中国表面工程, 2016, 29(3): 34-40.
[23].杨万里. 手足表面α、β污染检测仪的研制[D]. 衡阳: 南华大学, 2021.

相似文献/References:

[1]王槐乾,姜宏伟,王方标,等.工艺参数对磁控溅射TiN膜结构的影响[J].电镀与精饰,2019,(12):20.[doi:10.3969/j.issn.1001-3849.2019.12.005]
 WANG Huaiqian,JIANG Hongwei,WANG Fangbiao,et al.The Effect of Process Parameters on the Structure of Magnetron Sputtering TiN Films[J].Plating & Finishing,2019,(08):20.[doi:10.3969/j.issn.1001-3849.2019.12.005]
[2]刘 燕*,许彦伟,殷小健,等.紧固件真空镀铝层耐腐蚀性能评价[J].电镀与精饰,2020,(10):12.[doi:10.3969/j.issn.1001-3849.2020.10.0030]
 LIU Yan*,XU Yanwei,YIN Xiaojian,et al.Corrosion Resistance of Aluminum Coatings on Fastener[J].Plating & Finishing,2020,(08):12.[doi:10.3969/j.issn.1001-3849.2020.10.0030]
[3]白睿,武英桐,李晓敏,等.真空退火温度对磁控溅射氧化钒薄膜结构和光学性能的影响[J].电镀与精饰,2020,(11):25.[doi:10.3969/j.issn.1001-3849.2020.11.0060]
 BAI Rui,WU Yingtong,LI Xiaoming,et al.Influence of Vacuum Annealing Temperature on Structure and Optical Properties of the Vanadium Oxide Films by Magnetron Sputtering[J].Plating & Finishing,2020,(08):25.[doi:10.3969/j.issn.1001-3849.2020.11.0060]
[4]刘瑞霞*,朱福栋,由国艳.等离子体增强的磁控溅射TiSiN薄膜结构与耐蚀性[J].电镀与精饰,2021,(2):11.[doi:10.3969/j.issn.1001-3849.2021.02.0030]
 LIU Ruixia*,ZHU Fudong,YOU Guoyan.刘瑞霞*,朱福栋,由国艳[J].Plating & Finishing,2021,(08):11.[doi:10.3969/j.issn.1001-3849.2021.02.0030]
[5]朱云龙,孙 芳*,姜宏伟,等.磁控溅射法制备纳米Cu薄膜及其微结构的研究[J].电镀与精饰,2022,(3):29.[doi:10.3969/j.issn.1001-3849.2022.03.006]
 ZHU Yunlong,SUN Fang*,JIANG Hongwei,et al.Preparation and Microstructure of Cu Thin Films by Magnetron Sputtering[J].Plating & Finishing,2022,(08):29.[doi:10.3969/j.issn.1001-3849.2022.03.006]
[6]付保英*. 磁控溅射CrSiN涂层及其摩擦磨损性能研究 [J].电镀与精饰,2022,(7):36.[doi:10.3969/j.issn.1001-3849.2022.07.007]
 FU Baoying *.Study on Friction and Wear Properties of CrSiN Coatings Deposited by Magnetron Sputtering[J].Plating & Finishing,2022,(08):36.[doi:10.3969/j.issn.1001-3849.2022.07.007]
[7]朱云龙,孙 芳*,姜宏伟.磁控溅射法制备Cu/ITO薄膜及其耐蚀性能研究[J].电镀与精饰,2023,(2):86.[doi:10.3969/j.issn.1001-3849.2023.02.014]
 Zhu Yunlong,Sun Fang*,Jiang Hongwei.Preparation and corrosion resistance performance of magnetron sputtered Cu/ITO films[J].Plating & Finishing,2023,(08):86.[doi:10.3969/j.issn.1001-3849.2023.02.014]
[8]杨 岭,潘应君*,郑世恩,等.石墨表面磁控溅射钛膜的结构与工艺参数研究[J].电镀与精饰,2023,(3):11.[doi:10.3969/j.issn.1001-3849.2023.03.002]
 Yang Ling,Pan Yingjun*,Zheng Shien,et al.Structure and process parameters of titanium films prepared by magnetron sputtering on graphite[J].Plating & Finishing,2023,(08):11.[doi:10.3969/j.issn.1001-3849.2023.03.002]
[9]刘永超 ?路亚娟,李润清,娄金刚,等.陶瓷表面金属化工艺研究[J].电镀与精饰,2023,(6):38.[doi:10.3969/j.issn.1001-3849.2023.06.006]
 Liu Yongchao Lu Yajuan,Li Runqing,Lou Jingang,et al.Research on metallization process of ceramic surface?/html>[J].Plating & Finishing,2023,(08):38.[doi:10.3969/j.issn.1001-3849.2023.06.006]
[10]徐文慧,刘 杰,袁志响,等.磁控溅射法制备氧化锆涂层及其绝缘性能研究[J].电镀与精饰,2023,(7):68.[doi:10.3969/j.issn.1001-3849.2023.07.009]
 Xu Wenhui,Liu Jie,Yuan Zhixiang,et al.Preparation and insulation properties of zirconia coating by magnetron sputtering[J].Plating & Finishing,2023,(08):68.[doi:10.3969/j.issn.1001-3849.2023.07.009]

更新日期/Last Update: 2025-08-11