参考文献/References:
[1].木易. 核辐射的危害有多大[J]. 生命与灾害, 2017(2): 26-27.
[2].冯子雅, 杨小勇, 陈群, 等. 核辐射防护原则—内外兼防[J]. 山东工业技术, 2019(8): 245.
[3].Krishno C, Ram P, Chandra D H, et al. A review on radionuclide pollution in global soils with environmental and health hazards evaluation[J]. Environmental Geochemistry and Health, 2023, 45(12): 9245-9266.
[4].张烨, 闫平. 国内辐射监测仪表发展探讨[J]. 产业与科技论坛, 2018, 17(16): 101-102.
[5].李占双. 西安核仪器厂—书写核仪器耀眼篇章[J]. 中国核工业, 2015(3): 50-52.
[6].Pino F, Fontana C L, Delgado J, et al. Characterization of a medium-sized CLLB scintillator: single neutron/gamma detector for radiation monitoring[J]. Journal of Instrumentation, 2021, 16(11):11034.
[7].Srivastavav S, Mitra P, Singh S K, et al. Investigation of a SiPM-GGAG: Ce, B scintillator detector for environmental gamma radiation monitoring[J]. Journal of Instrumentation, 2022, 17(3): T03001.
[8].曹保锋, 宋立军, 肇文丽, 等. 一种α、β射线探测器: 中国, CN201410065825.1[P]. 2017-10-27.
[9].赵丹, 梁庭, 林立娜, 等. 磁控溅射法低温制备Al膜工艺参数的优化[J]. 微纳电子技术, 2017, 54(12): 852-857, 870.
[10].Khachatryan H, Lee S, Kim K, et al. Al thin film: The effect of substrate type on Al film formation and morphology[J]. Journal of Physics and Chemistry of Solids, 2018, 122: 109-117.
[11].李振宇, 范宇峰, 刘铖, 等. 国产超薄双面镀铝聚酯薄膜的工艺改进和热物性研究[J]. 表面技术, 2018, 47(9): 219-222.
[12].李兆营. 功率对直流磁控溅射氧化钒薄膜电学性能的影响[J]. 电镀与精饰, 2023, 45(4): 45-50.
[13].徐文慧, 刘杰, 袁志响, 等. 磁控溅射法制备氧化锆涂层及其绝缘性能研究[J]. 电镀与精饰, 2023, 45(7): 68-73.
[14].汪中祥, 李永荃. 等离子体预处理对BOPET镀铝膜镀铝层附着性能的影响研究[J]. 安徽科技, 2021, (7): 45-46.
[15].张以忱. 第二十一讲真空卷绕镀膜[J]. 真空, 2021, 58(5): 110-112.
[16].Jiang H, Zhu J, Huang Q, et al. The influence of residual gas on boron carbide thin films prepared by magnetron sputtering[J]. Applied Surface Science, 2011, 257(23): 9946-9952.
[17].赵印中, 许旻, 李林, 等. 磁控溅射法制备高反射铝膜[J]. 真空与低温, 2008(3): 164-166.
[18].钟志有, 周金, 杨玲玲. 溅射时间对掺镓氧化锌透明导电薄膜特性的影响[J]. 中南民族大学学报(自然科学版), 2011, 30(3): 34-37.
[19].Ulises B V, Marcelo S O. Morphological and structural characterization of magnetron-sputtered aluminum and aluminum-boron thin films[J]. Crystals, 2021, 11(5): 492.
[20].韦春贝, 代明江, 高阳, 等. AZ91D镁合金磁控溅射镀铝膜及其化学转化后的耐蚀性[J]. 电镀与涂饰, 2012, 31(4): 30-33.
[21].Khachatryan H, Lee S N, Kim K B, et al. Al thin film: The effect of substrate type on Al film formation and morphology[J]. Journal of Physics and Chemistry of Solids, 2018, 122: 109-117.
[22].李海兵, 徐勇军, 蔡其文, 等. 太阳能高反射薄膜制备技术对薄膜性能的影响[J]. 中国表面工程, 2016, 29(3): 34-40.
[23].杨万里. 手足表面α、β污染检测仪的研制[D]. 衡阳: 南华大学, 2021.
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